Shield Liquid Guide for Substrate Processing Apparatus

Solution Overview

Problem

Existing substrate processing technologies face challenges in preventing processing liquid from remaining on shields, which can lead to quality deterioration and reduced efficiency due to increased humidity and prolonged drying times.

Innovation Solution

A substrate processing apparatus and method that includes a liquid receiving cup, a processing chamber with a shield, and a processing liquid guide, where the liquid receiving cup moves between processing positions to ensure the processing liquid dropped onto the shield falls downward, preventing its adhesion and allowing for efficient substrate processing.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a shield is used to block processing liquid spray, then substrate protection is improved, but processing liquid accumulates on the shield causing humidity increase and drying time extension

Engineering Contradiction:

Improvesubstrate protectionVSAvoiddrying time

Core Design Contradiction:

ReliabilityVSLoss of time

Solution Approach 1:

The patent extracts the harmful accumulated liquid from the shield surface using a liquid discharge mechanism (blade or wiper) that actively removes and discharges the liquid, preventing its harmful effects while maintaining the shield's protective function

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces an intermediary liquid discharge mechanism (blade or wiper) between the shield surface and the processing chamber, which mediates the removal of accumulated liquid and prevents it from causing humidity increase and extended drying time

Inventive Principle:

Principle #24Intermediary (Mediator)

2Reliability

If processing liquid remains on the shield, then substrate protection is maintained, but substrate quality deteriorates due to liquid contamination

Engineering Contradiction:

Improvesubstrate protectionVSAvoidsubstrate quality

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The patent extracts the harmful accumulated liquid from the shield surface using a liquid discharge mechanism (blade or wiper) that actively removes and discharges the liquid, preventing its harmful effects while maintaining the shield's protective function

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces an intermediary liquid discharge mechanism (blade or wiper) between the shield surface and the processing chamber, which mediates the removal of accumulated liquid and prevents it from causing humidity increase and extended drying time

Inventive Principle:

Principle #24Intermediary (Mediator)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration effectively prevents processing liquid from remaining on the shield, reducing the risk of substrate quality deterioration and enhancing processing efficiency by ensuring timely and effective drying.

Implementation Method 1

a processing liquid guide that causes a processing liquid dropped onto the shield to fall downward

Methodology Applied

Scientific EffectGravity: Gravitation

Data Source

PatentUS11482428B2Substrate processing apparatus and substrate processing method

Publication Date: 2022.10.25 TOKYO ELECTRON LTD

AI summary

A substrate processing apparatus includes: a substrate holder; a processing liquid supply nozzle that supplies a processing liquid to a substrate held by the substrate holder; a liquid receiving cup that receives the processing liquid supplied to the substrate; a processing chamber that accommodates the liquid receiving cup and has an opening at an upper side; a shield that shields a region outside the liquid receiving cup in the opening of the processing chamber; a driver that moves the liquid receiving cup between a first processing position separated from the shield and a second processing position above the shield; and a processing liquid guide that causes a processing liquid dropped onto the shield to fall downward.