Showerhead Flow Adjusting Plate for Film Thickness Uniformity

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Solution Overview

Problem

Existing substrate processing apparatuses face challenges in achieving uniform in-plane distribution of film thickness during processes like film deposition, leading to inefficiencies and inconsistencies in the deposited films.

Innovation Solution

The introduction of a showerhead with a gas flow passage system, including a base member, a shower plate, gas supply members, and a flow adjusting plate in the gas diffusion space, which helps to distribute gases uniformly across the substrate, reducing high-pressure areas and improving gas flow merging, thereby enhancing film thickness uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If gas supply members are disposed in the gas diffusion space without additional flow adjustment structures, then the device complexity is reduced, but the in-plane uniformity of film thickness deteriorates

Engineering Contradiction:
Improvein-plane uniformity of film thicknessVSAvoidstructure complexity of showerhead
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The flow adjusting plate serves as an intermediary component between the gas supply members and the substrate. It mediates the gas flow distribution by providing a controlled diffusion path, ensuring uniform gas delivery across the substrate surface without requiring complex individual flow control mechanisms for each gas supply member.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The invention changes the physical parameters of the gas diffusion space by introducing the flow adjusting plate with specific geometric features (such as openings or channels). This modifies the flow characteristics, pressure distribution, and diffusion patterns to achieve uniform film thickness while maintaining a relatively simple overall structure.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If multiple gas supply members are disposed close to each other in the gas diffusion space, then the gas flow passage length is reduced, but gas flow merging issues arise leading to poor film uniformity

Engineering Contradiction:
Improvefilm thickness uniformityVSAvoidgas flow distribution efficiency
Core Design Contradiction:
Manufacturing precisionVSSpeed

Solution Approach 1:

The flow adjusting plate acts as an intermediary that receives gas flow from multiple closely-spaced supply members and redistributes it uniformly. It prevents direct flow merging issues by providing separate diffusion paths or controlled interaction zones, ensuring that gas from adjacent supply members combines smoothly without creating localized high-pressure areas.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Ease of manufacture

If the showerhead structure is simplified without flow adjusting plates, then the ease of manufacture is improved, but the gas flow distribution uniformity deteriorates

Engineering Contradiction:
Improveshowerhead manufacturing simplicityVSAvoidgas flow distribution uniformity
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The flow adjusting plate introduces controlled geometric parameters (opening sizes, shapes, and distributions) that directly influence gas flow distribution. By optimizing these parameters, the invention achieves uniform film deposition while maintaining a manufacturing process that is relatively simple and scalable.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration results in improved in-plane uniformity of the deposited tungsten film, as evidenced by reduced standard deviation and average film thickness, enhancing the overall processing efficiency and consistency of the substrate processing apparatus.

Implementation Method 1

a base member in which a gas flow passage is provided

Methodology Applied
Scientific EffectGas flow:

Implementation Method 2

a gas diffusion space being formed between the shower plate and the base member

Methodology Applied
Scientific EffectGas diffusion: Diffusion

Implementation Method 3

reducing high-pressure areas and improving gas flow merging

Methodology Applied
Scientific EffectPressure distribution: Pressure Gradient

Data Source

PatentUS12188125B2Showerhead and substrate processing apparatus
Publication Date: 2025.01.07 TOKYO ELECTRON LTD
  • US12188125B2 patent drawing
  • US12188125B2 patent drawing
  • US12188125B2 patent drawing

AI summary

A showerhead includes a shower plate, a base member in which a gas flow passage is provided, the base member fixing the shower plate, a plurality of gas supply members disposed in a gas diffusion space and connected to the gas flow passage, the gas diffusion space being formed between the shower plate and the base member, and a flow adjusting plate disposed in the gas diffusion space, the flow adjusting plate being disposed on an outer periphery on an outer side from the plurality of gas supply members.