Shutter Contact Structure for Plasma Leakage Suppression
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Solution Overview
Problem
Conventional plasma processing apparatuses suffer from plasma leakage due to the disconnection of electrical contact between the valve body and the baffle plate during thermal expansion, leading to plasma diffusion into the exhaust system and deterioration of plasma uniformity.
Innovation Solution
A substrate processing apparatus with a shutter mechanism featuring a conductive elastic member that maintains electrical contact between the valve body and the baffle plate through a vertically inclined portion and a contact member, ensuring continuous electrical connection despite thermal expansion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a rigid shutter mechanism is used to close the chamber opening, then the shutter can effectively block plasma leakage, but thermal expansion causes disconnection of electrical contact between the valve body and baffle plate
Solution Approach 1:
The patent applies a flexible elastic member (such as a spring or elastic ring) as the contact member between the valve body and baffle plate. This elastic member can deform to accommodate thermal expansion while maintaining continuous electrical contact, resolving the contradiction between rigid plasma blocking and flexible electrical connection under thermal stress
Solution Approach 2:
The patent changes the physical state of the contact member from rigid to elastic, allowing it to dynamically adjust its deformation state in response to thermal expansion. This parameter change enables the system to maintain electrical contact continuity while accommodating temperature-induced dimensional changes
2Ease of manufacture
If the shutter is designed with fixed electrical contacts, then manufacturing is simpler, but thermal expansion disconnects the electrical contact during operation
Solution Approach 1:
The elastic member provides a manufacturable solution that balances simplicity with reliability. The elastic component can be easily installed as a ring or spring between the valve body and baffle plate, requiring no complex assembly procedures while ensuring continuous electrical contact through its inherent flexibility
Solution Approach 2:
The elastic member automatically adjusts to thermal expansion through its own deformation, eliminating the need for external adjustment mechanisms or complex control systems. The self-adjusting nature maintains electrical contact stability without adding manufacturing complexity
3Productivity
If conventional shutter mechanisms are used, then plasma processing can be performed, but plasma leaks into the exhaust system causing uniformity deterioration
Solution Approach 1:
The contact member acts as an intermediary element that ensures continuous electrical connection between the valve body and baffle plate. This intermediary function prevents plasma leakage by maintaining the electrical barrier, allowing plasma processing to proceed without harmful plasma diffusion into the exhaust system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses plasma leakage by maintaining electrical contact, thereby preserving plasma uniformity and preventing damage to the shutter components, even under high thermal stress conditions.
Implementation Method 1
a contact member disposed on a side surface of the substrate support and formed of a conductive elastic member
Implementation Method 2
a baffle plate disposed between an inner peripheral side of the chamber and the substrate support and having a vertically inclined portion at an end portion on a substrate support side
Data Source
AI summary
A substrate processing apparatus comprises a substrate support disposed in the chamber, a shutter including a valve body configured to open and close an opening of the chamber, and a baffle plate disposed between an inner peripheral side of the chamber and the substrate support and having a vertically inclined portion at an end portion on a substrate support side, and a contact member disposed on a side surface of the substrate support and formed of a conductive elastic member. In a state where the shutter is closed, contact between the end portion on the substrate support side and the contact member is maintained.