Multifunctional Shutter Disk for Single-Chamber Wafer Processing

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Solution Overview

Problem

The existing semiconductor manufacturing process chamber systems require multiple transfers of wafers between dedicated degas, pre-clean, and deposition chambers, leading to increased processing time and reduced throughput due to the need for separate chambers for each function.

Innovation Solution

Implementing a multifunctional chamber equipped with a multifunctional shutter disk capable of performing degas, pre-clean, and deposition processes, which eliminates the need for separate chambers and reduces transfer time by integrating these functions into a single chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If separate dedicated chambers are used for degas, pre-clean, and deposition processes, then each process can be performed with specialized equipment, but the processing time increases and throughput decreases due to multiple wafer transfers between chambers

Engineering Contradiction:
Improveprocess qualityVSAvoidthroughput rate
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent combines degas, pre-clean, and deposition processes into a single integrated chamber. The shutter disk mechanism allows the chamber to perform multiple functions sequentially without requiring wafer transfer to separate chambers, thereby maintaining process quality while eliminating transfer time and increasing throughput.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The chamber is designed as a multifunctional unit capable of performing degas, pre-clean, and deposition processes. The shutter disk with different functional surfaces enables the same chamber to execute different process steps, making the system universal and eliminating the need for multiple dedicated chambers.

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Reliability

If multiple separate chambers are used for different processes, then each chamber can be optimized for its specific function, but the system complexity increases and more transfer mechanisms are required

Engineering Contradiction:
Improveprocess specializationVSAvoidnumber of chambers
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The chamber is designed as a multifunctional unit capable of performing degas, pre-clean, and deposition processes. The shutter disk with different functional surfaces enables the same chamber to execute different process steps, making the system universal and eliminating the need for multiple dedicated chambers.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The shutter disk is divided into different functional surfaces or zones that can be selectively positioned to perform different process steps. This segmentation of function within a single chamber allows specialized processes to occur without requiring separate physical chambers.

Inventive Principle:
Principle #1Segmentation

3Reliability

If wafers are transferred between multiple chambers for degas, pre-clean, and deposition, then each process step can be completed, but the total processing time increases reducing the throughput rate

Engineering Contradiction:
Improveprocess completionVSAvoidtransfer time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent combines degas, pre-clean, and deposition processes into a single integrated chamber. The shutter disk mechanism allows the chamber to perform multiple functions sequentially without requiring wafer transfer to separate chambers, thereby maintaining process quality while eliminating transfer time and increasing throughput.

Inventive Principle:
Principle #5Merging (Combining)

Solution Approach 2:

The integrated chamber design allows continuous processing where degas, pre-clean, and deposition steps can be performed sequentially without interruption for wafer transfer. The shutter disk enables smooth transition between process steps, maintaining continuous useful action and eliminating idle transfer time.

Inventive Principle:
Principle #20Continuity of useful action

Data Source

PatentUS11920237B2Providing multifunctional shutter disk above the workpiece in the multifunctional chamber during degassing or pre-cleaning of the workpiece, and storing the multifunctional shutter disc during deposition process in the same multifunctional chamber
Publication Date: 2024.03.05 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US11920237B2 patent drawing
  • US11920237B2 patent drawing
  • US11920237B2 patent drawing

AI summary

The present disclosure provides a multifunction chamber having a multifunctional shutter disk. The shutter disk includes a lamp device, a DC/RF power device, and a gas line on one surface of the shutter disk. With this configuration, simplifying the chamber type is possible as the various specific, dedicated chambers such as a degas chamber, a pre-clean chamber, a CVD/PVD chamber are not required. By using the multifunctional shutter disk, the degassing function and the pre-cleaning function are provided within a single chamber. Accordingly, a separate degas chamber and a pre-clean chamber are no longer required and the overall transfer time between chambers is reduced or eliminated.