Multifunctional Shutter Disk for Single-Chamber Wafer Processing
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing semiconductor manufacturing process chamber systems require multiple transfers of wafers between dedicated degas, pre-clean, and deposition chambers, leading to increased processing time and reduced throughput due to the need for separate chambers for each function.
Innovation Solution
Implementing a multifunctional chamber equipped with a multifunctional shutter disk capable of performing degas, pre-clean, and deposition processes, which eliminates the need for separate chambers and reduces transfer time by integrating these functions into a single chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If separate dedicated chambers are used for degas, pre-clean, and deposition processes, then each process can be performed with specialized equipment, but the processing time increases and throughput decreases due to multiple wafer transfers between chambers
Solution Approach 1:
The patent combines degas, pre-clean, and deposition processes into a single integrated chamber. The shutter disk mechanism allows the chamber to perform multiple functions sequentially without requiring wafer transfer to separate chambers, thereby maintaining process quality while eliminating transfer time and increasing throughput.
Solution Approach 2:
The chamber is designed as a multifunctional unit capable of performing degas, pre-clean, and deposition processes. The shutter disk with different functional surfaces enables the same chamber to execute different process steps, making the system universal and eliminating the need for multiple dedicated chambers.
2Reliability
If multiple separate chambers are used for different processes, then each chamber can be optimized for its specific function, but the system complexity increases and more transfer mechanisms are required
Solution Approach 1:
The chamber is designed as a multifunctional unit capable of performing degas, pre-clean, and deposition processes. The shutter disk with different functional surfaces enables the same chamber to execute different process steps, making the system universal and eliminating the need for multiple dedicated chambers.
Solution Approach 2:
The shutter disk is divided into different functional surfaces or zones that can be selectively positioned to perform different process steps. This segmentation of function within a single chamber allows specialized processes to occur without requiring separate physical chambers.
3Reliability
If wafers are transferred between multiple chambers for degas, pre-clean, and deposition, then each process step can be completed, but the total processing time increases reducing the throughput rate
Solution Approach 1:
The patent combines degas, pre-clean, and deposition processes into a single integrated chamber. The shutter disk mechanism allows the chamber to perform multiple functions sequentially without requiring wafer transfer to separate chambers, thereby maintaining process quality while eliminating transfer time and increasing throughput.
Solution Approach 2:
The integrated chamber design allows continuous processing where degas, pre-clean, and deposition steps can be performed sequentially without interruption for wafer transfer. The shutter disk enables smooth transition between process steps, maintaining continuous useful action and eliminating idle transfer time.
Data Source
AI summary
The present disclosure provides a multifunction chamber having a multifunctional shutter disk. The shutter disk includes a lamp device, a DC/RF power device, and a gas line on one surface of the shutter disk. With this configuration, simplifying the chamber type is possible as the various specific, dedicated chambers such as a degas chamber, a pre-clean chamber, a CVD/PVD chamber are not required. By using the multifunctional shutter disk, the degassing function and the pre-cleaning function are provided within a single chamber. Accordingly, a separate degas chamber and a pre-clean chamber are no longer required and the overall transfer time between chambers is reduced or eliminated.


