Shutter Gap Control Using Magnetic Repulsion
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Solution Overview
Problem
In substrate treating processes, the friction between the shutter and housing generates particles that can contaminate the substrate, especially during high-temperature chemical processes, affecting the efficiency and quality of the treatment.
Innovation Solution
A substrate treating apparatus with a door assembly that includes a shutter, a driving member, and a gap maintaining unit using magnetism to maintain a constant gap between the shutter and the housing, preventing particle generation by utilizing repulsive magnetic forces to keep the shutter from contacting the housing.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the shutter contacts the housing to open and close the inlet, then the shutter can be effectively controlled, but particle is generated due to friction between the shutter and housing
Solution Approach 1:
A magnetic field is introduced as an intermediary force between the shutter and housing. The magnetic attraction force allows the shutter to move and be held in position without direct mechanical contact with the housing, thereby preventing particle generation while maintaining reliable control.
Solution Approach 2:
The mechanical contact-based shutter control system is replaced with a magnetic field-based system. Instead of relying on friction and direct contact for shutter movement and positioning, the invention uses magnetic attraction forces to achieve the same control functions without mechanical wear and particle generation.
2Reliability
If the shutter is used to block the inlet during substrate processing, then the process space can be sealed, but thermal deformation causes the shutter to rub against the housing generating particles
Solution Approach 1:
The magnetic field serves as an intermediary that maintains the shutter's position relative to the housing without requiring physical contact. Even when thermal deformation occurs, the magnetic force adjusts to maintain the gap, preventing the shutter from rubbing against the housing and generating particles while still maintaining process space sealing.
Solution Approach 2:
The invention changes the control parameter from mechanical contact force to magnetic attraction force. This parameter change allows the system to accommodate thermal deformation of the shutter without generating particles, as the magnetic field can dynamically adjust to maintain the optimal gap between shutter and housing.
3Productivity
If down-flow air current is formed to prevent by-product diffusion, then process efficiency is improved, but air current applies pressure to the shutter causing it to contact the housing and generate particles
Solution Approach 1:
The mechanical pressure balance system is replaced with a magnetic force-based positioning system. Instead of relying on air pressure to hold the shutter in position, the magnetic attraction force provides stable positioning that is independent of air current variations, allowing efficient down-flow air currents to be used without causing shutter contact and particle generation.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively prevents particle generation during substrate treatment, enhancing the process efficiency and maintaining the cleanliness of the substrate by ensuring the shutter does not rub against the housing, thus improving the overall treatment quality.
Implementation Method 1
The gap maintaining unit may maintain the constant gap using magnetism. The gap maintaining unit may contain an inner magnetism member provided at the shutter; and an outer magnetism member placed at the outside of the shutter to face to the inner magnetism member. The inner magnetism member and the outer magnetism member may be configured such that repulsive power acts between the inner magnetism member and the outer magnetism member.
Data Source
AI summary
A substrate treating apparatus is provided which includes housing and a door assembly. The housing provides a process space for treating a substrate therein and has an opening formed at a sidewall thereof. The door assembly opens and closes the opening. The door assembly includes a shutter, a driving member, and a gap maintaining unit. The driving member transfers the shutter to an open position where the shutter faces to the opening and to a blocking position where the shutter gets out of the open position. The gap maintaining unit maintains a constant gap between the shutter and the sidewall.