Shutter Member Sealing for Substrate Processing
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Solution Overview
Problem
The existing substrate processing apparatuses face challenges in maintaining airtightness due to plasma diffusion and sealing member deterioration, leading to compromised plasma uniformity and increased leak rates.
Innovation Solution
A substrate processing apparatus with a decaying mechanism and a sealing member made of material with a tensile strength greater than 12.1 MPa, featuring a radical trap ring and fluorinated O-ring, which blocks radicals and ions, preventing their invasion and subsequent damage to the sealing member.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If a gate valve is provided outside the chamber to open and close the opening, then the semiconductor wafer can be carried in or out, but the plasma diffuses into the space where the opening protrudes to the air side, deteriorating plasma uniformity
Solution Approach 1:
A shutter member is introduced as an intermediary component between the chamber opening and the gate valve. The shutter member opens and closes the opening from the inside of the chamber, preventing plasma diffusion to the external space while still allowing wafer transport when opened. This mediator structure resolves the contradiction by isolating the plasma environment from the external atmosphere during processing.
2Ease of operation
If the gate valve sealing member is exposed to plasma, then the valve can function for wafer transport, but the sealing member is deteriorated by plasma, increasing leak rates
Solution Approach 1:
The shutter member acts as a protective intermediary that shields the gate valve sealing member from direct plasma exposure. By positioning the shutter between the plasma environment and the sealing member, it prevents plasma-induced deterioration while maintaining the gate valve's wafer transport functionality, thus preserving chamber airtightness.
Solution Approach 2:
The shutter member performs a preliminary protective action by closing the chamber opening before plasma generation occurs. This preliminary closure prevents plasma from reaching and deteriorating the sealing member in the first place, ensuring long-term reliability of the chamber seal.
3Manufacturing precision
If a shutter is used to block the opening from plasma, then plasma uniformity is maintained, but the driving unit and connecting mechanisms are exposed to plasma, causing sealing member deterioration
Solution Approach 1:
The connecting shaft is designed with a through-hole structure that allows it to function as a plasma barrier. The shutter driving unit and its sealing members are positioned on the external side of the chamber, isolated from plasma by the shaft structure. This intermediary design maintains plasma uniformity inside the chamber while protecting the driving mechanism components from plasma exposure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively suppresses sealing member damage and maintains chamber airtightness, significantly reducing leak rates and ensuring consistent plasma processing conditions.
Implementation Method 1
converting a processing gas supplied in the space of the processing chamber into plasma by the high frequency power to generate ions or radicals
Implementation Method 2
a decaying mechanism provided with the connecting shaft inserted therein and configured to decay the radicals or the ions
Data Source
AI summary
In a substrate processing apparatus of the present disclosure, a bearing member includes a decaying mechanism provided with a connecting shaft inserted therein and configured to decay radicals or ions; a first member configured to cover the decaying mechanism; and a second member disposed at the connecting shaft and provided with the connecting shaft inserted therein while being in contact with a sealing member. Further, an end of the first member and an end of the second member are connected to be engaged with each other, an invasion path is formed to allow the radicals to invade from the connected portion of the end of the first member and the end of the second member, and the invasion path is formed to be folded back in an extending direction of the connecting shaft. The sealing member is made of a material having a tensile strength larger than 12.1 MPa.