Lithography Shutter Partition Plate Light Leakage
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In lithography apparatuses, existing shutter units fail to completely shield exposure light due to gaps and reflections, leading to unintended light exposure of substrates during the exposure cycle, which affects the quality and productivity of semiconductor device manufacturing.
Innovation Solution
A shutter unit with multiple shutter members and partition plates that rotate to cross the optical path, including light shielding and transmissive portions, and a motor-driven mechanism to control the rotation, with partition plates positioned between shutter members to minimize light leakage by absorbing and redirecting stray light.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If a shutter member is driven to open and close, then the shutter operation speed is increased, but light leakage occurs through gaps around the shutter member
Solution Approach 1:
A partition plate is introduced as an intermediary component between the front stage shutter member and the substrate. This partition plate blocks light leakage paths that would otherwise reach the substrate through gaps around the rotating shutter member, while not interfering with the high-speed rotation capability of the shutter mechanism itself
2Speed
If the shutter member size is reduced, then the shutter operation speed is increased, but light shielding performance deteriorates
Solution Approach 1:
The solution transitions from relying solely on the shutter member's radial dimensions for light blocking to utilizing the axial dimension by introducing a partition plate extending in the optical path direction. This multi-dimensional approach allows compact shutter members to maintain effective light shielding through the combined action of the shutter member and partition plate
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces light leakage to 5% or less compared to conventional designs, enhancing light shielding performance and improving the productivity of semiconductor device manufacturing by ensuring precise light control during exposure cycles.
Implementation Method 1
a partition plate arranged at a location between the plurality of shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member
Data Source
AI summary
A shutter unit that opens and closes an optical path of light for a lithography apparatus is provided. The shutter unit includes a motor which rotatably drives a shaft extended along a rotation axis of the motor, and a plurality of shutter members attached to the shaft, each including a light shielding portion and a light transmissive portion. The shutter unit further includes a partition plate arranged at a location between the shutter members to avoid a portion through which a light beam passes and configured to shield light that has leaked from a front stage shutter member.