Shuttered Gate Valve Sealing Pocket Against Deposition

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Gate valves in processing equipment allow gases to flow into recesses, leading to deposits and corrosion, which can contaminate substrates during processing due to pressure changes or vibrations.

Innovation Solution

A gate valve design with a pocket and shutter mechanism that seals the pocket when open, combined with heaters to prevent deposition, ensuring contaminants do not re-enter the process environment.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If the gate valve opening is exposed to allow gas flow, then the flow control function is improved, but deposits and corrosion occur in the recess

Engineering Contradiction:
Improvegas flow controlVSAvoiddeposits and corrosion
Core Design Contradiction:
ProductivityVSObject-affected harmful factors

Solution Approach 1:

The gate valve is segmented into functional zones: the opening for gas flow and the recess for gate movement. A shutter is introduced to selectively seal the recess, allowing the opening to remain exposed for flow control while protecting the recess from harmful gas exposure during operation.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

A shutter is introduced as an intermediary component between the opening and the recess. This shutter selectively seals the recess when the gate is in the open position, preventing process gases and byproducts from entering the recess and causing deposits or corrosion, while allowing unrestricted flow through the opening.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Reliability

If the gate is disposed within the pocket when open, then the sealing function is improved, but process gases can still enter the recess causing contamination

Engineering Contradiction:
Improvesealing functionVSAvoidcontamination from deposits
Core Design Contradiction:
ReliabilityVSObject-generated harmful factors

Solution Approach 1:

The shutter is positioned and operated to seal the recess before process gases can enter and cause contamination. By preliminarily sealing the recess when the gate is open, the system prevents deposits from forming on the gate and subsequent contamination from breaking free during pressure changes or vibrations.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The shutter acts as an intermediary barrier that separates the clean recess environment from the process gas flow. This intermediary component prevents harmful factors from reaching the gate while allowing the gate to maintain its sealing function when closed.

Inventive Principle:
Principle #24Intermediary (Mediator)

3Object-generated harmful factors

If heaters are added to prevent deposition, then the cleanliness is improved, but the device complexity increases

Engineering Contradiction:
Improvedeposition preventionVSAvoidheater system
Core Design Contradiction:
Object-generated harmful factorsVSDevice complexity

Solution Approach 1:

The patent replaces potential mechanical cleaning systems with a thermal field approach using heaters. Instead of mechanically removing deposits, heaters maintain the gate and recess surfaces at temperatures that prevent deposition, simplifying the overall system while effectively addressing contamination.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the temperature parameter of the gate and recess surfaces by introducing heaters. By maintaining elevated temperatures, the system prevents process gases and byproducts from condensing or depositing on surfaces, thereby preventing contamination without requiring complex mechanical cleaning mechanisms.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

Prevents deposition of process gases and byproducts within the gate valve, reducing contamination risks and maintaining a clean process environment.

Implementation Method 1

a shutter configured to selectively seal the pocket when the gate is in the open position

Methodology Applied
Scientific EffectPhysical sealing:

Implementation Method 2

In some embodiments, one or more heaters may be coupled to at least one of the body or the shutter

Methodology Applied
Scientific EffectThermal heating: Heating

Implementation Method 3

heating the gate valve to prevent deposition of a contaminant on exposed portions of the gate valve

Methodology Applied
Scientific EffectThermal prevention of deposition: Deposition (physical)

Implementation Method 4

a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening

Methodology Applied
Scientific EffectMechanical sealing:

Data Source

PatentUS8877001B2Shuttered gate valve
Publication Date: 2014.11.04 APPLIED MATERIALS INC
  • US8877001B2 patent drawing
  • US8877001B2 patent drawing
  • US8877001B2 patent drawing

AI summary

Embodiments of gate valves and methods of using same are provided herein. In some embodiments, a gate valve for use in a process chamber may include a body having an opening disposed therethrough from a first surface to an opposing second surface of the body; a pocket extending into the body from a sidewall of the opening; a gate movably disposed within the pocket between a closed position that seals the opening and an open position that reveals the opening and disposes the gate completely within the pocket; and a shutter configured to selectively seal the pocket when the gate is disposed in the open position. In some embodiments, one or more heaters may be coupled to at least one of the body or the shutter.