Sibling Wire Routing for Signal Delay Reduction

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Solution Overview

Problem

As semiconductor process technology advances to 7 nm and below, the increase in process rule complexity and narrower metal wires lead to higher electrical resistance and signal delay, which slows down circuits, and traditional workarounds like widening wires or using via pillars become impractical due to design rule restrictions and inefficiencies.

Innovation Solution

Implementing sibling wire routing and via placement, where multiple parallel wires and vias are used to reduce resistance and electromigration issues, allowing for efficient routing and placement without compromising complex design rules, using design tools to automatically detect critical nets and introduce sibling elements dynamically.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If wire width is reduced to match advanced process technology (7 nm and below), then manufacturing precision is improved, but electrical resistance increases and signal delay increases

Engineering Contradiction:
Improvewire width controlVSAvoidsignal speed
Core Design Contradiction:
Manufacturing precisionVSSpeed

Solution Approach 1:

The patent divides a single wire into multiple parallel sibling wires (e.g., two or more wires running side by side). Each wire maintains the narrow width required for 7 nm process precision, but the combined parallel structure provides multiple conduction paths, effectively reducing total resistance and signal delay while adhering to the manufacturing precision requirements of advanced processes.

Inventive Principle:
Principle #1Segmentation

2Reliability

If wire width is increased to reduce resistance, then electrical resistance decreases, but design rule complexity is violated and manufacturing becomes impractical

Engineering Contradiction:
Improveelectrical conductivityVSAvoiddesign rule compliance
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

Instead of widening a single wire (which would violate design rules at 7 nm), the patent segments the conduction function across multiple narrow parallel wires. Each individual wire remains within the strict width specifications required by advanced manufacturing processes, while the collective arrangement achieves the desired electrical conductivity without violating any design rules.

Inventive Principle:
Principle #1Segmentation

3Adaptability or versatility

If via pillars are used to route signals, then routing flexibility is improved, but device complexity increases and placement efficiency decreases

Engineering Contradiction:
Improverouting flexibilityVSAvoidvia placement complexity
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The patent merges the routing function into the metal layer itself by placing sibling wires directly in the metal layer without requiring via pillars for routing. This consolidation eliminates the need for complex via pillar structures and multiple routing steps, reducing device complexity while maintaining routing flexibility through the parallel wire arrangement.

Inventive Principle:
Principle #5Merging (Combining)

Data Source

PatentUS10776554B1Sibling wire routing
Publication Date: 2020.09.15 SIEMENS INDUSTRY SOFTWARE INC
  • US10776554B1 patent drawing
  • US10776554B1 patent drawing
  • US10776554B1 patent drawing

AI summary

A placed netlist is routed. A circuit is obtained that implements the placed netlist. A net in the circuit is identified to be enhanced. Space adjacent to a wire associated with the net that would accommodate a parallel wire is reserved.