SiC Consumable Part Recovery via CVD Deposition
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Solution Overview
Problem
Plasma processing apparatus consumable parts, such as focus rings and upper electrode plates made of silicon, are eroded during the plasma process, leading to uneven plasma distribution and requiring frequent replacement, resulting in waste and long manufacturing times for new parts.
Innovation Solution
The method involves forming silicon carbide (SiC) lumps by chemical vapor deposition (CVD), cleaning and remanufacturing eroded consumable parts, and redepositing SiC to extend their usable life, allowing for repeated plasma processing without scrapping.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If consumable parts are replaced after erosion, then plasma uniformity is maintained, but manufacturing time and waste increase
Solution Approach 1:
The patent recovers eroded consumable parts by depositing new material (SiC or silicon) onto the eroded surfaces, restoring their original dimensions and plasma-forming properties. This recovery process eliminates the need to discard eroded parts and manufacture entirely new components, thereby maintaining plasma uniformity while significantly reducing manufacturing time and waste.
Solution Approach 2:
The patent changes the material composition of consumable parts by using composite structures (e.g., SiC substrate with silicon coating, or silicon substrate with SiC coating). This parameter change in material composition provides dual benefits: the base material (SiC) offers erosion resistance, while the coating material (silicon) ensures plasma uniformity, thereby extending part life without compromising performance.
2Reliability
If consumable parts are replaced after erosion, then plasma uniformity is maintained, but material waste increases
Solution Approach 1:
Instead of discarding eroded consumable parts, the patent recovers them by depositing new material onto the eroded surfaces. This recovery process restores the parts to their original functional state, eliminating material waste associated with manufacturing new parts while maintaining plasma uniformity throughout extended usage.
Solution Approach 2:
The patent employs composite material structures where a erosion-resistant substrate (SiC) is combined with a plasma-uniformity-providing coating (silicon). This composite approach maximizes the utilization of each material's properties, extending part life and reducing the frequency of replacement, thereby minimizing material waste.
3Reliability
If new consumable parts are manufactured from silicon lumps, then plasma uniformity is ensured, but manufacturing time becomes excessively long
Solution Approach 1:
The patent recovers eroded consumable parts through material deposition, restoring their original dimensions and plasma-forming properties. This recovery process eliminates the need for time-consuming manufacturing of new parts from silicon lumps, thereby maintaining plasma uniformity while significantly improving manufacturing efficiency and reducing downtime.
Solution Approach 2:
The patent performs preliminary material deposition onto eroded parts to restore their functional dimensions before they are fully worn out. This preliminary recovery action prevents the need for complete replacement and subsequent time-consuming manufacturing, thereby maintaining plasma uniformity while improving overall productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces waste by allowing the reuse of consumable parts, maintaining plasma uniformity, and extending their service life, thus improving processing efficiency and reducing the need for frequent replacements.
Implementation Method 1
forming a silicon carbide (SiC) lump by depositing SiC by chemical vapor deposition (CVD)
Implementation Method 2
cleaning a surface of the consumable part that has been eroded by the plasma process
Data Source
AI summary
A method of reusing a consumable part for use in a plasma processing apparatus includes cleaning a surface of the consumable part made of SiC that has been eroded by a first plasma process performed for a specific period of time. The method further includes depositing SiC on the cleaned surface of the eroded consumable part by CVD. The method also includes remanufacturing a consumable part having a predetermined shape by machining the eroded consumable part on which the SiC is deposited for performing a second plasma process on a substrate by using the remanufactured consumable part.