SiC Crystal Growth Using Offset Seed Positioning

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Conventional physical vapor transport (PVT) methods for growing silicon carbide (SiC) crystals face challenges in maintaining consistent process conditions, leading to defects such as low angle grain boundaries, dislocations, and inclusions, which affect the quality and consistency of the grown boules.

Innovation Solution

The use of an offset seed position with respect to the central vertical axis of the furnace creates a radial temperature gradient during crystal growth, improving the quality of the silicon carbide boules by reducing defect densities through controlled step-flow and macrostep movement.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Volume of moving object

If conventional PVT method with centered seed position is used, then large-sized boules can be produced, but the crystal quality is degraded due to difficulty in controlling process parameters and temperature gradients

Engineering Contradiction:
Improveboule sizeVSAvoidcrystal quality
Core Design Contradiction:
Volume of moving objectVSManufacturing precision

Solution Approach 1:

The patent applies asymmetry by positioning the seed crystal offset from the central vertical axis of the furnace. This asymmetric positioning creates a controlled radial temperature gradient across the seed surface, which promotes uniform crystal growth and reduces defects such as low angle grain boundaries, dislocations, and micropipes, thereby improving crystal quality while maintaining large boule production capability

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The offset seed positioning creates different local temperature conditions across the seed surface. The radial temperature gradient ensures that different regions of the seed experience optimized local growth conditions, with the cooler region receiving sufficient vapor flux while the warmer region prevents excessive deposition rates, leading to improved overall crystal quality

Inventive Principle:
Principle #3Local quality

2Manufacturing precision

If process conditions are maintained for single crystal growth, then high quality product can be produced, but run-to-run variability still exists due to sensitivity to temperature variations

Engineering Contradiction:
Improveproduct qualityVSAvoidrun-to-run consistency
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The asymmetric offset positioning of the seed creates an inherent radial temperature gradient that is stable and reproducible across different growth runs. This configuration is less sensitive to small variations in overall furnace temperature, as the gradient is determined by the fixed geometric offset rather than absolute temperature control, thereby improving run-to-run consistency

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent changes the spatial parameter of seed positioning from centered to offset position. This parameter change fundamentally alters the temperature distribution pattern, creating a stable radial gradient that is more robust to process variations and leads to reduced run-to-run variability in crystal quality

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in higher quality silicon carbide crystals with reduced threading screw and basal plane dislocation densities, enhancing the material's performance properties and reducing run-to-run variability.

Implementation Method 1

a source such as powdered silicon carbide, is provided in a high temperature region of a crystal growth furnace and heated. The powdered silicon carbide is heated to sublime

Methodology Applied
Scientific EffectSublimation: Sublimation

Implementation Method 2

the resulting vapors reach the cooler silicon carbide seed and deposit on its exposed surface to initiate crystal growth

Methodology Applied
Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS10793972B1High quality silicon carbide crystals and method of making the same
Publication Date: 2020.10.06 II VI ADVANCED MATERIALS LLC
  • US10793972B1 patent drawing
  • US10793972B1 patent drawing
  • US10793972B1 patent drawing

AI summary

A physical vapor transport (PVT) apparatus suitable for growing SiC boules comprises a crystal growth chamber (with a defined central vertical axis), a sealed crucible containing sublimation source material and including a seed fixture disposed in an offset position with respect to the central vertical axis of the apparatus, and a heat source disposed to surround the crystal growth chamber. The heat source is configured to raise the temperature within the sealed crucible such that the source material vaporizes and deposits on the seed wafer. The offset position of the seed fixture creates a radial temperature gradient across an exposed surface of the seed as the crystal boule is grown.