Substrate-Free SiC Epitaxial Power Semiconductors for Lower Loss

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Solution Overview

Problem

Power semiconductor devices fabricated with wide bandgap materials like silicon carbide often suffer from increased series resistance and conduction losses due to the presence of a silicon carbide substrate.

Innovation Solution

The development of semiconductor devices that utilize a wide bandgap epitaxial layer without a silicon carbide substrate, where the epitaxial layer is mounted in a flip chip configuration on a submount, providing a thermal path for heat dissipation that does not include a semiconductor substrate.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a silicon carbide substrate is used to fabricate power semiconductor devices, then the devices can be manufactured with wide bandgap materials, but the series resistance increases and conduction losses increase

Engineering Contradiction:
Improvedevice performanceVSAvoidconduction losses
Core Design Contradiction:
ReliabilityVSLoss of energy

Solution Approach 1:

The patent extracts and removes the silicon carbide substrate from the device structure, retaining only the necessary epitaxial layer. This elimination of the substrate directly reduces the series resistance and conduction losses while maintaining the device's functional performance through alternative support structures.

Inventive Principle:
Principle #2Taking out (Extraction)

2Stability of the object's composition

If a silicon carbide substrate is used to provide mechanical support, then the device structure is stable, but the thermal performance deteriorates due to increased bulk resistivity

Engineering Contradiction:
Improvestructural stabilityVSAvoidthermal performance
Core Design Contradiction:
Stability of the object's compositionVSTemperature

Solution Approach 1:

The silicon carbide substrate is removed from the structure, eliminating the thermal resistance associated with bulk substrate conduction. The device achieves structural stability through alternative means (such as bonding to a submount or carrier) while benefiting from improved thermal performance through direct heat dissipation paths.

Inventive Principle:
Principle #2Taking out (Extraction)

3Temperature

If the epitaxial layer is mounted in a flip chip configuration on a submount, then the thermal path is improved for heat dissipation, but the device complexity increases

Engineering Contradiction:
Improveheat dissipationVSAvoidmounting structure
Core Design Contradiction:
TemperatureVSDevice complexity

Solution Approach 1:

Instead of the conventional configuration where the substrate provides both mechanical support and thermal management, the patent inverts the approach by removing the substrate and mounting the epitaxial layer directly to a submount in flip chip configuration. This reversal creates optimized thermal paths while the submount assumes the mechanical support function.

Inventive Principle:
Principle #13The other way round (Inversion)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach reduces bulk resistivity and improves thermal performance by eliminating the silicon carbide substrate, thereby enhancing the efficiency and reliability of power semiconductor devices.

Implementation Method 1

The second surface of the epitaxial silicon carbide layer provides at least a portion of a thermal path configured to dissipate heat from the wide bandgap epitaxial layer

Methodology Applied
Scientific EffectHeat dissipation: Conduction (thermal)

Data Source

PatentUS20250194191A1Power Semiconductor Devices
Publication Date: 2025.06.12 WOLFSPEED INC
  • US20250194191A1 patent drawing
  • US20250194191A1 patent drawing
  • US20250194191A1 patent drawing

AI summary

Power semiconductor devices are provided. In one example, a semiconductor device includes a wide bandgap epitaxial layer. The wide bandgap epitaxial layer includes silicon carbide. The wide bandgap epitaxial layer has a first surface and an opposing second surface. The semiconductor device includes a first contact on the first surface of the wide bandgap epitaxial layer. The second surface is not in direct or indirect contact with a silicon carbide substrate.