Detachable Silicon Carbide Etching Tool for Multi-Wafer Throughput

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

The existing etching process for silicon carbide wafers is inefficient, resulting in low productivity and long processing times due to the fixed nature of single wafer etching, which limits the number of wafers that can be etched simultaneously and inflexibly manages production schedules.

Innovation Solution

A detachable etching tool with parallel support columns and a fastening mechanism, including a telescopic spring and guide post system, allows for flexible placement and removal of multiple silicon carbide wafers, enabling efficient and rapid etching by supporting multiple wafers simultaneously and facilitating easy adjustment of the etching crucible size.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If single wafer etching is used, then the etching process is simple to operate, but the productivity is low and processing time is long

Engineering Contradiction:
Improveetching productivityVSAvoidetching tool structure
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The etching tool is divided into multiple independent bracket units (first bracket, second bracket, etc.), each capable of holding and etching a wafer independently. This segmentation allows multiple wafers to be processed simultaneously, increasing productivity from 6 pcs/H to 24 pcs/H while maintaining operational simplicity through modular design

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The bracket structure is designed as a universal component that can be repeatedly installed and removed from the etching tool. Each bracket serves multiple functions: holding the wafer, positioning it correctly, and being easily detachable for cleaning or replacement. This multi-functionality enables the same bracket design to handle multiple wafers across different etching cycles

Inventive Principle:
Principle #6Universality (Multi-functionality)

2Adaptability or versatility

If fixed bracket structure is used, then the tool structure is simple, but the etching quantity is inflexible

Engineering Contradiction:
Improveetching quantity flexibilityVSAvoidbracket installation mechanism
Core Design Contradiction:
Adaptability or versatilityVSDevice complexity

Solution Approach 1:

The bracket installation mechanism transitions from a fixed structure to a dynamic, adjustable system. Brackets can be installed and removed according to production requirements, allowing the etching quantity to be flexibly adjusted. The fastening mechanism includes movable components that enable easy attachment and detachment, making the system adaptable to different production volumes

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

Brackets are pre-designed with standardized fastening features (fastening holes, positioning structures) that allow for quick installation and removal. This preliminary preparation of the bracket structure enables rapid reconfiguration of the etching tool to match different production schedules and quantities without complex adjustments

Inventive Principle:
Principle #10Preliminary action

3Productivity

If single wafer etching is used, then the process control is simple, but the unit productivity is low

Engineering Contradiction:
Improveunit productivityVSAvoidprocessing time
Core Design Contradiction:
ProductivityVSLoss of time

Solution Approach 1:

Multiple wafer etching processes are merged into a single operational cycle. By installing multiple brackets (first bracket, second bracket, etc.) on the same etching tool, multiple wafers are etched simultaneously in the chemical solution, combining what would otherwise be separate sequential operations into one parallel process, reducing total processing time and increasing unit productivity

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The detachable etching tool significantly increases productivity by allowing 24 wafers to be etched per hour compared to 6, reducing processing time by four times, and enables flexible adjustment to meet changing production demands.

Implementation Method 1

the inner wall of the base is provided with a fixing seat which is connected with a slider through the telescopic spring and the telescopic guide post

Methodology Applied
Scientific EffectElasticity: Elasticity

Data Source

PatentUS12046486B2Etching tool for demountably etching multiple pieces of silicon carbide
Publication Date: 2024.07.23 HUNAN SANAN SEMICON CO LTD
  • US12046486B2 patent drawing
  • US12046486B2 patent drawing
  • US12046486B2 patent drawing

AI summary

A detachable etching tool for etching a plurality of silicon carbide pieces has a first supporting column and a second supporting column, both of which are fixed through a tool fixing block. A bracket is arranged on the tool fixing block, and a limiting rod is installed on the lower end surface of the bracket. The bracket is inserted into the tool fixing block through the limiting rod and fixed on the tool fixing block with a fastening mechanism that comprises a base, a fixing seat, a telescopic spring, a telescopic guide column, a sliding block, a guide block, an inserting rod and a push-pull mechanism. The etching tool addresses low productivity per unit time and long time consumption in the etching processing.