Self-Biased 4H-SiC MOS Radiation Detector

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Solution Overview

Problem

Current radiation detectors for harsh environment applications, such as space missions, face challenges with high power consumption and the need for external power supplies, and existing 4H-SiC betavoltaic cells have limited conversion efficiency due to poor radiocurrent and high surface recombination.

Innovation Solution

A betavoltaic cell with a Ni/Y2O3/4H-SiC heteroepitaxial MOS structure is developed, where a 40 nm thick yttrium oxide layer is epitaxially grown using pulsed laser deposition on a 20 μm thick n-type 4H-SiC epilayer, reducing dark current and surface recombination, and enhancing hole diffusion length.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional Schottky barrier diodes are used for radiation detection, then device simplicity is maintained, but surface recombination is high and charge collection efficiency is limited

Engineering Contradiction:
Improvecharge collection efficiencyVSAvoidsurface recombination
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

A 40 nm thick yttrium oxide (Y2O3) layer is deposited as an intermediary between the metal contact and the 4H-SiC epilayer. This intermediate oxide layer passivates surface states and reduces surface recombination velocity, thereby improving hole collection efficiency from the depleted region while maintaining device performance.

Inventive Principle:
Principle #24Intermediary (Mediator)

Solution Approach 2:

The device employs a composite metal-oxide-semiconductor (MOS) structure combining nickel metal, yttrium oxide insulator, and 4H-SiC semiconductor. This composite architecture leverages the low surface recombination velocity of the oxide layer and the high charge carrier mobility of the SiC epilayer to achieve superior radiation detection performance compared to simple Schottky barrier diodes.

Inventive Principle:
Principle #40Composite materials

2Reliability

If heteroepitaxial MOS structure with yttrium oxide is implemented, then surface recombination is reduced and charge collection efficiency improves, but device fabrication complexity increases

Engineering Contradiction:
Improvecharge collection efficiencyVSAvoidfabrication process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent replaces complex multi-step chemical vapor deposition or atomic layer deposition processes with pulsed laser deposition (PLD) to form the yttrium oxide layer. PLD enables precise control of oxide thickness and stoichiometry through laser ablation of a Y2O3 target, simplifying the fabrication process while achieving the desired surface passivation quality.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

3Use of energy by moving object

If self-biased operation at zero applied bias is achieved, then power consumption is eliminated, but energy resolution performance must be maintained without external power supply

Engineering Contradiction:
Improvepower consumptionVSAvoidenergy resolution
Core Design Contradiction:
Use of energy by moving objectVSMeasurement precision

Solution Approach 1:

The MOS device structure inherently generates a built-in potential at the metal-oxide-semiconductor interface due to band bending and fixed charges in the oxide layer. This self-biasing effect creates an internal electric field that separates electron-hole pairs and collects charges without requiring external power supply, enabling zero-power operation while maintaining radiation detection functionality.

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The Ni/Y2O3/4H-SiC betavoltaic cell achieves a high charge collection efficiency of 82% and energy resolution of 72 keV FWHM at zero bias, with a maximum power density output of 11 nW/cm3 and fill factor of 66% when exposed to a 2.5 mCi 63Ni beta particle emitter, demonstrating improved performance over traditional Schottky barrier diodes.

Implementation Method 1

depositing yttrium oxide epitaxial layers through pulsed laser deposition on high quality 4H—SiC epitaxial layers

Methodology Applied
Scientific EffectPulsed laser deposition: Pulsed Laser Deposition

Implementation Method 2

a betavoltaic cell for power generation in harsh environment applications

Methodology Applied
Scientific EffectBetavoltaics: Betavoltaics

Data Source

PatentUS20240055149A1Self-biased 4h-sic MOS devices for radiation detection
Publication Date: 2024.02.15 UNIVERSITY OF SOUTH CAROLINA
  • US20240055149A1 patent drawing
  • US20240055149A1 patent drawing
  • US20240055149A1 patent drawing

AI summary

Described herein are methods and systems for fabrication of high-performing metal-oxide-semiconductor (MOS) devices by depositing yttrium oxide epitaxial layers through pulsed laser deposition on high quality 4H—SiC epitaxial layers. The novel MOS devices revealed an extraordinarily long hole diffusion length that has never been reported. These devices have been investigated as radiation detectors which demonstrated an excellent radiation response at zero applied bias (self-biased) with a record-high energy resolution.