SiC MOSFET Threshold Stabilization via Charge Trap Insulator

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Solution Overview

Problem

Silicon carbide (SiC) MOSFETs face challenges in maintaining a stable threshold value due to temperature variations, as the threshold value tends to decrease with increasing temperature, affecting the reliability and efficiency of semiconductor devices.

Innovation Solution

Incorporating a charge trap region in the insulating film, such as an SiN or SiON film, which traps charges and adjusts the threshold value by applying a shift voltage, stabilizing the threshold value and improving ON/OFF switching characteristics.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Temperature

If a conventional SiC MOSFET structure is used, then high breakdown field strength and thermal conductivity are achieved, but the threshold value decreases with temperature increase

Engineering Contradiction:
Improveoperating temperature rangeVSAvoidthreshold value stability
Core Design Contradiction:
TemperatureVSReliability

Solution Approach 1:

The patent applies preliminary action by forming a charge trap region in the insulating film before the device operates. This charge trap region pre-stores charges that will be released to compensate for threshold voltage shifts occurring during high-temperature operation, thereby maintaining stable threshold characteristics across temperature variations

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The patent changes the physical and chemical parameters of the insulating film by introducing a charge trap region with specific trap density and depth. This modification alters the charge distribution characteristics of the insulating film, enabling it to dynamically adjust and stabilize the threshold voltage under varying temperature conditions

Inventive Principle:
Principle #35Parameter changes

2Speed

If the threshold value is lowered to improve switching speed, then ON/OFF switching characteristics are enhanced, but power consumption increases

Engineering Contradiction:
Improveswitching speedVSAvoidpower consumption
Core Design Contradiction:
SpeedVSUse of energy by moving object

Solution Approach 1:

The patent applies dynamics by creating a dynamically adjustable threshold voltage through the charge trap region. The threshold voltage can adaptively change based on operating conditions, allowing the device to optimize between switching speed and power consumption differentially under various operating states rather than being fixed

Inventive Principle:
Principle #15Dynamics

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution effectively stabilizes the threshold value of SiC MOSFETs across temperature variations, enhancing reliability and reducing power consumption by adjusting the threshold voltage, allowing for efficient high-temperature operation with improved switching characteristics.

Implementation Method 1

The insulating film includes a charge trap region trapping charges

Methodology Applied
Scientific EffectCharge trapping:

Data Source

PatentUS9741798B2Semiconductor device
Publication Date: 2017.08.22 KK TOSHIBA
  • US9741798B2 patent drawing
  • US9741798B2 patent drawing
  • US9741798B2 patent drawing

AI summary

According to one embodiment, a semiconductor device includes a structure, an insulating film, a control electrode, first and second electrodes. The structure has a first surface, and includes a first, a second, and a third semiconductor region. The structure has a portion including the first, second, and third semiconductor regions arranged in a first direction along the first surface. The insulating film is provided on the first surface. The control electrode is provided on the insulating film. The first electrode is electrically connected to the third semiconductor region. The second electrode is electrically connected to the first semiconductor region. The insulating film includes a charge trap region. A bias voltage is applied to the first and second electrodes, and includes a shift voltage. The shift voltage shifts a reference potential of a voltage applied to the first and second electrodes by a certain voltage.