Silane Coupling Agent Surface Treatment for Semiconductor Package Adhesion
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Solution Overview
Problem
The existing methods for manufacturing semiconductor packages face challenges with low adhesion between the die pad and the sealing resin, leading to potential peeling and cracks due to thermal expansion differences, which can affect electrical resistance and heat dissipation, and insufficient adhesion between the sealing resin and the semiconductor element.
Innovation Solution
A method involving a surface treatment with a silane coupling agent on the die pad, semiconductor element, and connecting members after mounting and connection, creating regions with different bonding strengths to manage thermal stress and improve adhesion between the die pad, semiconductor element, and sealing resin.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a roughening process is performed on the die pad to increase adhesion, then the adhesion between die pad and sealing resin is improved, but the manufacturing process complexity increases
Solution Approach 1:
The invention changes the chemical parameter of the die pad surface by applying a silane coupling agent, transforming the surface chemistry to enhance adhesion. This chemical modification approach replaces mechanical roughening processes, achieving strong bonding between the inorganic die pad and organic sealing resin without adding complex manufacturing steps
Solution Approach 2:
The silane coupling agent acts as an intermediary substance between the inorganic die pad and organic sealing resin. It forms a chemical bridge that facilitates strong adhesion between these incompatible materials, resolving the fundamental incompatibility issue without requiring complex surface treatment processes
2Reliability
If the sealing resin is peeled off due to thermal expansion differences, then the die pad and sealing resin can accommodate thermal stress, but cracks may occur to the bonding member
Solution Approach 1:
The silane coupling agent is applied beforehand to the die pad surface, creating a protective intermediate layer that cushions the thermal stress between components with different thermal expansion coefficients. This prevents direct stress transmission to the bonding member, avoiding cracks while accommodating thermal expansion differences
3Reliability
If the adhesion between sealing resin and semiconductor element is increased, then the thermal stress resistance is improved, but the electrical characteristics may be affected
Solution Approach 1:
The silane coupling agent creates different adhesion characteristics in different regions: strong adhesion on the die pad surface and controlled adhesion on the semiconductor element surface. This localized differentiation allows strong thermal stress resistance where needed while maintaining electrical characteristics where required
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enhances the bonding strength between the die pad and sealing resin, and between the semiconductor element and sealing resin, reducing the likelihood of cracks and improving electrical characteristics by distributing thermal stress effectively.
Implementation Method 1
a silane coupling agent is applied onto a surface of the heat dissipation substrate, thereby improving the adhesion between the resin substrate and the heat dissipation substrate
Implementation Method 2
a silane coupling agent is applied onto a surface of the heat dissipation substrate, thereby improving the adhesion between the resin substrate and the heat dissipation substrate
Implementation Method 3
the sealing resin and the semiconductor element relatively move based on the difference in thermal expansion coefficients between the semiconductor element and the sealing resin
Data Source
AI summary
In a semiconductor package, surfaces of a die pad, a semiconductor element, a connecting member, and a lead are subjected to a surface treatment with a silane coupling agent. A first surface of a plurality of surfaces of the semiconductor device includes a first region where an organic substance is exposed, and a second region where an inorganic substance is exposed, the first surface being bonded with the connecting member. A bonding strength between the first region and the sealing resin is weaker than a bonding strength between the second region and the sealing resin.


