Silane-Modified Epoxy Bezel Pattern Composition for Rework
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing bezel pattern compositions for display substrates face challenges in achieving strong adhesion without high-temperature processing and easy removal after curing, as they either have poor adhesion or are difficult to remove without damaging the substrate.
Innovation Solution
A photopolymerizable composition comprising a colorant, epoxy monomer, oxetane monomer, vinyl monomer, cationic photopolymerization initiator, adhesion promoter, and diluting solvent, which forms a bezel pattern that can be easily removed using solvents and wipers after curing, while maintaining excellent adhesion and curing sensitivity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If a cationic photopolymerizable composition based on epoxy compound is used to achieve excellent adhesion to glass substrate, then adhesion is improved, but the cured bezel pattern becomes difficult to remove without damaging the substrate
Solution Approach 1:
The patent introduces a specific parameter change by incorporating a silane-modified epoxy monomer with controlled silane content (0.1-5 mass%). This modifies the chemical composition parameters of the epoxy network, creating a balanced structure that provides both adhesion strength and controlled removability through solvent interaction with the silane groups.
Solution Approach 2:
The patent creates a composite photopolymerizable composition combining epoxy monomer, silane-modified epoxy monomer, and specific photoinitiators. This composite material system achieves both strong adhesion through epoxy-silane bonding and controlled removal through solvent interaction with silane groups, resolving the contradiction between strength and ease of repair.
2Ease of repair
If a free radical photopolymerizable composition based on acrylic compound is used to enable easy removal after curing, then removability is improved, but large volume shrinkage during polymerization requires high-temperature heating process which may damage the substrate
Solution Approach 1:
The patent replaces the high-temperature heating process (mechanical/thermal system) with a photopolymerization process initiated by UV light exposure. This substitution eliminates the need for high-temperature heating while maintaining effective curing, and the resulting silane-modified network structure provides both adhesion and controlled removability without thermal damage risk.
Solution Approach 2:
The patent changes the polymerization mechanism parameter from free radical (acrylic-based) to cationic photopolymerization (epoxy-silane-based). This parameter change reduces volume shrinkage, eliminates high-temperature requirements, and enables controlled removability through solvent interaction with silane groups.
3Productivity
If defect inspection is performed after completing all printing and exposure processes to shorten processing time, then productivity is improved, but the cured bezel pattern must be removed for rework
Solution Approach 1:
The silane-modified epoxy monomer acts as an intermediary that enables both strong adhesion during normal operation and controlled removal when needed. The silane groups provide a chemical pathway for solvent interaction, allowing easy removal of defective patterns without compromising the substrate, thus supporting post-inspection rework processes.
Solution Approach 2:
The patent modifies the chemical composition parameters by incorporating silane-modified epoxy monomer at controlled concentrations. This parameter change creates a dual-state material that adheres strongly during service but can be selectively removed using solvents, enabling flexible inspection and rework timing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition allows for a bezel pattern with excellent adhesion to the display substrate, easy removal, and improved curing sensitivity, reducing the risk of substrate damage during the rework process.
Implementation Method 1
a photopolymerizable composition for forming a bezel pattern, comprising a colorant, an epoxy monomer, an oxetane monomer, a vinyl monomer, a cationic photopolymerization initiator
Data Source
AI summary
A photopolymerizable composition for forming a bezel pattern developed to be applied on a display substrate, a method for forming a bezel pattern using the same, a bezel pattern manufactured thereby, a display substrate comprising a bezel pattern manufactured thereby, and a rework method for removing a bezel pattern having a defective printed pattern are disclosed herein. In some embodiments, the composition includes a colorant, an epoxy monomer, an oxetane monomer, a vinyl monomer, a cationic photopolymerization initiator, an adhesion promoter and a diluting solvent, the oxetane monomer comprises a monofunctional oxetane monomer and a difunctional oxetane monomer. The composition is suitable for manufacturing a bezel pattern that is easily removed, has sufficient adhesion to a display substrate, and good curing sensitivity and pencil hardness, without requiring a high-temperature heating process.