Photosensitive resin composition, photosensitive resin film, photosensitive dry film, pattern forming method, and light-emitting element

The patent uses a composite photosensitive resin composition comprising multiple components: (A) glycidyl group-containing silicone resin, (B) photocationic polymerization initiator, and (C) polymer with quantum dots coordinated with silane coupling agent. This composite material approach enables simultaneous achievement of high lithography resolution and favorable luminous properties by combining the advantages of each component in the resin system.

The patent modifies the chemical parameters of the photosensitive resin composition by introducing specific functional groups and coordination structures. The quantum dots are coordinated with silane coupling agents having specific ligand substituents (amino, thiol, carboxy, phosphino, or phosphine oxide groups), and the resin contains glycidyl groups that react during curing. These parameter changes enable the resin to achieve both high resolution patterning and excellent luminous performance.

The patent introduces silane coupling agents as intermediary substances that coordinate with quantum dots and integrate them into the polymer matrix. The silane coupling agents act as mediators between the quantum dots and the resin matrix, preventing quantum dot escape during development while maintaining their luminous properties. The coordination structure formed by silane coupling agents with ligand substituents (amino, thiol, carboxy, phosphino, or phosphine oxide groups) ensures stable quantum dot retention.

The patent creates a composite structure where quantum dots are incorporated into a polymer matrix through coordination with silane coupling agents. This composite material approach ensures that quantum dots remain stable within the resin composition during the development process while maintaining their color conversion functionality and luminous properties.