Silica Coating Film Formation in Fine Grooves
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Solution Overview
Problem
The miniaturization of semiconductor devices requires forming dense silica-based coating films in fine grooves, but existing methods fail to fully convert the application liquid into SiO2 at the groove bottom due to oxygen deficiencies, leading to side etching issues during hydrofluoric acid washing.
Innovation Solution
An application liquid containing a siloxane polymer and a specific base generator, represented by a particular chemical formula, is used to form a dense silica-based coating film by applying, heating, and baking, which generates a Si—O—Si network even in fine grooves.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If an application liquid is embedded into fine grooves for formation of pre-metal dielectric films, then the coating can reach fine structures, but the application liquid at the groove bottom is not completely converted into SiO2 due to oxygen deficiency, leading to failure in forming a dense silica-based coating film
Solution Approach 1:
The invention changes the chemical composition parameters of the application liquid by incorporating specific silane compounds (such as tetraethoxysilane, methyltrimethoxysilane) and catalysts (such as hydrochloric acid, sulfuric acid) in controlled amounts. These parameter changes enable complete conversion to dense SiO2 even in oxygen-deficient groove bottom environments, resolving the contradiction between coating coverage and conversion completeness.
2Ease of manufacture
If a dense silica-based coating film is not formed at the groove bottom, then the application liquid can be easily applied, but side etching occurs during hydrofluoric acid washing of contact holes
Solution Approach 1:
The invention modifies the chemical parameters of the coating film by using specific silane compounds and catalysts that ensure complete conversion to dense SiO2. This parameter change creates a coating film with sufficient etching resistance to prevent side etching during hydrofluoric acid washing, while maintaining ease of application through the liquid formulation.
Solution Approach 2:
The invention uses composite material formulation combining multiple silane compounds (such as tetraethoxysilane and methyltrimethoxysilane) with catalysts and solvents. This composite approach creates a coating that provides both ease of application and complete conversion to dense SiO2, preventing side etching while maintaining process simplicity.
3Reliability
If high temperature reflowing is used to form silica-based coating films, then dense SiO2 conversion is achieved, but the process requires high energy consumption and complex equipment
Solution Approach 1:
The invention changes the temperature parameter by using chemically active silane compounds and catalysts that enable complete conversion to dense SiO2 at lower temperatures. This parameter change reduces energy consumption and simplifies equipment requirements while maintaining reliable SiO2 conversion density.
Solution Approach 2:
The invention replaces the thermal energy-driven conversion mechanism with a chemically-driven conversion mechanism. By using catalytic reactions of silane compounds, the conversion to dense SiO2 occurs at lower temperatures without requiring high-energy reflowing processes, thus substituting chemical action for thermal mechanical processing.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables the formation of a dense silica-based coating film within fine grooves, enhancing etching resistance and preventing side etching, as demonstrated by FT-IR spectra and SEM images, with improved coating properties and resistance to buffered hydrofluoric acid.
Implementation Method 1
a base generator which generates a base by the action of heat
Implementation Method 2
the application liquid at the groove bottom is not completely converted into SiO2
Implementation Method 3
formation of a Si—O—Si network
Data Source
AI summary
An application liquid capable of forming a dense silica-based coating film even when embedded into a fine groove, and a method for formation of a silica-based coating film using the application liquid are provided. An application liquid is used including (A) a siloxane polymer, and (B) a base generator represented by the following general formula (I):wherein, R1 and R2 are a hydrocarbon group having 1 to 5 carbon atoms and which may be the same or different; or one of R1 and R2 is a hydrogen atom and the other is a hydrocarbon group having 1 to 5 carbon atoms; when R1 and R2 are both a hydrocarbon group, these may bind to one another to form a ring structure; R3 is a linking group; and R4 is a condensed ring.