Silica Particles Surface Treatment C/Si Ratio Control

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Solution Overview

Problem

The challenge lies in uniformly surface-treating silica particles with a silicon compound, as existing methods often result in incomplete coverage and secondary aggregation, leading to inconsistent surface characteristics and affinity with resins, which affects storage stability and performance in applications such as semiconductor encapsulants.

Innovation Solution

The silica particles are treated with a specific silicon compound represented by the formula R2SiX2, where the C/Si ratio from X-ray photoelectron spectroscopy is not less than 0.05, ensuring uniform surface treatment and minimizing unreacted silicon compounds, thereby improving surface characteristics and resin affinity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If silica particles are surface-treated with a silicon compound such as a silane coupling agent, then the surface characteristics and affinity with resin are improved, but the treatment is not uniform and unreacted silicon compounds remain on the surface

Engineering Contradiction:

Improvesurface characteristics and resin affinityVSAvoiduniformity of surface treatment

Core Design Contradiction:

ReliabilityVSManufacturing precision

Solution Approach 1:

The patent changes the chemical parameters of the surface treatment process by specifying a silicon compound with the formula R2SiX2 where X is hydroxy, alkoxy, or acyloxy group, and controls the C/Si ratio from XPS to be not less than 0.05. This parameter control ensures uniform surface treatment while maintaining improved surface characteristics and resin affinity.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The patent applies preliminary surface treatment to silica particles before they are used in resin applications. By pre-treating the silica particles with the specific silicon compound under controlled conditions, the surface is uniformly modified in advance, preventing secondary aggregation and ensuring consistent performance in the final resin product.

Inventive Principle:

Principle #10Preliminary action

2Reliability

If surface treatment is performed with silicon compound, then affinity with resin is improved, but secondary aggregation occurs and storage stability decreases

Engineering Contradiction:

Improveaffinity with resinVSAvoidstorage stability

Core Design Contradiction:

ReliabilityVSStability of the object's composition

Solution Approach 1:

The patent controls the chemical composition parameters by specifying the silicon compound formula R2SiX2 and controlling the C/Si ratio from XPS to be not less than 0.05. This precise parameter control ensures that the surface treatment provides sufficient resin affinity while preventing excessive reaction that would cause secondary aggregation and reduce storage stability.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The silicon compound with formula R2SiX2 acts as an intermediary between the silica particles and the resin. The hydroxy, alkoxy, or acyloxy groups (X) provide controlled reactivity that mediates the interaction between silica and resin, improving affinity without causing harmful secondary aggregation that would reduce storage stability.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Stability of the object's composition

If surface treatment is insufficient, then secondary aggregation is reduced, but surface characteristics are not uniform and resin affinity is not improved sufficiently

Engineering Contradiction:

Improveuniformity of surface characteristicsVSAvoidresin affinity

Core Design Contradiction:

Stability of the object's compositionVSReliability

Solution Approach 1:

The patent optimizes the treatment parameters by controlling the C/Si ratio from XPS to be not less than 0.05 and using the specific silicon compound formula R2SiX2. This ensures sufficient surface treatment to achieve uniform surface characteristics and adequate resin affinity, avoiding both insufficient and excessive treatment conditions.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in uniformly treated silica particles with enhanced surface characteristics and resin affinity, reducing secondary aggregation and improving storage stability, making them suitable for semiconductor encapsulants and other applications.

Implementation Method 1

silica particles surface-treated with a silicon compound... surface-treated with a surface treating agent such as a silane coupling agent

Methodology Applied

Scientific EffectSurface treatment reaction: Chemical Bonding

Implementation Method 2

C/Si ratio from X-ray photoelectron spectroscopy (XPS)... measured by X-ray photoelectron spectrometry

Methodology Applied

Scientific EffectX-ray photoelectron spectroscopy detection: Photoelectric Effect

Implementation Method 3

affinity with a resin... improved surface characteristics and affinity with a resin

Methodology Applied

Scientific EffectSurface affinity: Adsorption

Data Source

PatentUS10533093B2Silica particles, resin composition containing said particles, and use thereof

Publication Date: 2020.01.14 NIPPON SHOKUBAI CO LTD

AI summary

The object of the present invention is to provide silica particles which are surface-treated with a silicon compound uniformly and have improved surface characteristics and affinity with a resin. The silica particles according the present invention are surface-treated with a specific silicon compound, wherein C/Si ratio from X-ray photoelectron spectroscopy (XPS) is not less than 0.05.