Amorphous Silicon Anode Coating for Scalable Roll-to-Roll Fabrication
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional wet coating processes for manufacturing silicon anode electrodes in battery cells are inefficient, environmentally harmful, and require additional processing stages, limiting the performance and durability of the electrodes.
Innovation Solution
A scalable roll-to-roll manufacturing process using magnetron sputtering to deposit an amorphous silicon layer onto a roughened copper current collector, eliminating the need for binders and solvents, and creating accidented surfaces for increased Li-ion conduction paths and stress relief.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If wet coating processes are used to manufacture silicon anode electrodes, then the manufacturing process is simple, but the process efficiency is low, environmental harm occurs, and additional processing stages are required
Solution Approach 1:
The patent replaces wet coating processes with magnetron sputtering, substituting a chemical/wet-based system with a physical vapor deposition system. This eliminates the need for solvents, binders, and additional drying/curing stages, thereby improving manufacturing efficiency while maintaining process simplicity through a single-step deposition process
Solution Approach 2:
The invention extracts and eliminates harmful components (solvents, binders, conductive additives) from the manufacturing process by using pure silicon sputtering. This removal of unnecessary materials simplifies the process and improves efficiency by eliminating associated processing stages while reducing environmental harm
2Ease of manufacture
If wet coating processes are used, then the process can be implemented with conventional equipment, but environmental harm occurs and additional processing stages are required
Solution Approach 1:
The patent substitutes wet chemical coating with physical vapor deposition via magnetron sputtering, eliminating environmental harm from solvents and chemicals. The process uses a controlled vacuum environment with pure silicon targets, removing harmful substances while maintaining ease of manufacture through established PVD equipment
Solution Approach 2:
The invention employs an inert vacuum atmosphere during sputtering to prevent contamination and eliminate environmental release of harmful substances. The closed vacuum system contains all processing, preventing environmental harm while allowing precise control of deposition conditions
3Adaptability or versatility
If wet coating processes are used, then the process can handle various materials, but the electrode performance and durability are limited
Solution Approach 1:
The patent changes the deposition parameters by using magnetron sputtering with controlled plasma conditions, substrate temperature, and deposition rate. These parameter changes produce denser, more uniform silicon layers with better adhesion to the current collector, thereby improving electrode performance and durability while maintaining versatility in handling different current collector materials
4Ease of manufacture
If conventional wet coating is used, then the manufacturing process is established, but energy density, power capability, and cyclability are limited
Solution Approach 1:
The invention replaces wet coating with magnetron sputtering to achieve superior electrode properties. The physical vapor deposition process creates denser, more uniform silicon layers with better electrical contact and reduced defects, thereby improving energy density and power capability while the process remains manufacturable through continuous roll-to-roll implementation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method enhances energy density, power capability, and cyclability of the anode electrodes by providing more electrolyte interfaces and stress relief, while reducing environmental impact and process complexity.
Implementation Method 1
using T sputtering targets arranged circumferentially around a portion of the roller, sputtering an amorphous silicon layer onto the roughened anode current collector
Implementation Method 2
an amorphous silicon layer deposited using physical vapor deposition (PVD) onto the roughened anode current collector
Data Source
AI summary
A method for manufacturing an anode electrode for a battery cell includes supplying a roughened anode current collector from a roll-to-roll chamber to a magnetron sputtering chamber; routing the roughened anode current collector around a roller in the magnetron sputtering chamber; using T sputtering targets arranged circumferentially around a portion of the roller, sputtering an amorphous silicon layer onto the roughened anode current collector to form an anode electrode, where T is an integer greater than one; and receiving the anode electrode from the magnetron sputtering chamber at the roll-to-roll chamber.