Silicon Fragment Sorting Using Height-Aided Size Measurement

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Solution Overview

Problem

Existing methods for sorting silicon fragments based on two-dimensional projection are prone to errors due to variations in fragment orientation, leading to miscalculations of size and subsequent misclassification.

Innovation Solution

A method and device that utilize additional height information from multiple measuring devices positioned around the fragment to capture its dimensions from different angles, combining 2D projection surface data with height data to accurately calculate the fragment's size and control deflection devices accordingly.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If two-dimensional projection measurement is used for fragment size determination, then the measurement process is simple, but sorting errors occur due to fragment orientation variations

Engineering Contradiction:
Improvemeasurement process complexityVSAvoidfragment size measurement accuracy
Core Design Contradiction:
Device complexityVSMeasurement precision

Solution Approach 1:

The patent transitions from two-dimensional projection measurement to three-dimensional measurement by adding height information capture. Multiple measuring devices are positioned at different spatial locations (above and below the profile plane) to capture height data, enabling accurate 3D reconstruction of fragment dimensions regardless of orientation. This dimensional expansion resolves the contradiction by maintaining measurement simplicity through automated multi-angle capture while achieving precise size determination.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Measurement precision

If multiple measuring devices are positioned around the fragment to capture height information, then sorting precision is improved, but device complexity increases

Engineering Contradiction:
Improvefragment size measurement accuracyVSAvoidmeasuring device configuration
Core Design Contradiction:
Measurement precisionVSDevice complexity

Solution Approach 1:

The patent implements universal measuring devices that can capture both projection surface and height information. The first measuring device captures the projection surface in the profile plane, while the same or additional devices capture height information above and below the plane. This multi-functional approach allows a single measuring system to perform multiple measurement tasks, reducing overall device complexity while maintaining high measurement precision through comprehensive data capture.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach significantly reduces sorting errors by ensuring precise size determination, resulting in improved separation quality and reduced misclassification rates.

Implementation Method 1

capturing the projection surface of a fragment in a 2D profile plane with at least one first measuring device

Methodology Applied
Scientific EffectOptical measurement: Photography

Implementation Method 2

capturing at least one height information above and/or below the 2D profile plane with at least one further measuring device

Methodology Applied
Scientific EffectOptical measurement: Photography

Data Source

PatentEP4429831B1Method and device for sorting silicon fragments
Publication Date: 2025.12.24 WACKER CHEMIE AG
  • EP4429831B1 patent drawingFigure 1~2
  • EP4429831B1 patent drawing
  • EP4429831B1 patent drawing

AI summary

The invention relates to a method for sorting fragments, said method comprising the following steps: - separating the fragments in a separating region, - detecting the projection surface of a fragment in a 2D profile plane using a first measurement device, - detecting at least one piece of height information above and/or below the 2D profile plane using a further measurement device, - calculating the size of the fragment from the projection surface and height information, - controlling at least one deflection device depending on the calculated size. The invention further relates to a device for performing the method.