Silicon-Nitride-Containing Silicon Oxide Anti-Reflection Layer
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Solution Overview
Problem
Optical articles with anti-reflection layers containing SiO2 as a low refractive index layer suffer from low abrasion resistance due to the hardness of SiO2 being lower than that of high refractive index layers, leading to potential abrasion and film detachment.
Innovation Solution
Incorporating a silicon-nitride-containing silicon oxide layer with the formula SisOtNu (s>0, t≥0, u>0) as the low refractive index layer, where Si3N4 is preferably used, to increase the hardness and abrasion resistance, and alternately laminating these layers with high refractive index layers like ZrO2 or TiO2 to enhance both anti-reflection properties and abrasion resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If SiO2 is used as the low refractive index layer of the anti-reflection layer, then the anti-reflection property is achieved, but the abrasion resistance is low
Solution Approach 1:
The patent changes the chemical composition parameters of the low refractive index layer by incorporating silicon nitride (Si3N4) into the SiO2 matrix, creating a composite material with formula SiO2-xSi3N4x. This compositional parameter change increases the hardness and abrasion resistance while maintaining the low refractive index property necessary for anti-reflection functionality.
Solution Approach 2:
The patent creates a composite material structure by combining SiO2 and Si3N4 in a single layer. The Si3N4 particles or phases are dispersed within the SiO2 matrix, forming a composite low refractive index layer that leverages the low refractive index of SiO2 and the high hardness of Si3N4 to simultaneously achieve anti-reflection and abrasion resistance.
2Strength
If the hardness of the low refractive index layer is increased to improve abrasion resistance, then the abrasion resistance improves, but the adhesion to other layers may deteriorate
Solution Approach 1:
The patent carefully controls the composition ratio of SiO2 and Si3N4 in the low refractive index layer to optimize both hardness and adhesion. By adjusting the amount of Si3N4 added to SiO2, the layer achieves sufficient hardness for abrasion resistance while maintaining chemical compatibility and bonding capability with adjacent hard coat and high refractive index layers.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The silicon-nitride-containing silicon oxide layers significantly improve the abrasion resistance of optical articles, preventing surface abrasion and film detachment while maintaining sufficient anti-reflection properties, and can be manufactured using existing ion-assisted deposition techniques without additional costs or steps.
Implementation Method 1
a layer that is provided on the optical base and contains SiO2 as a main component. The layer is a silicon-nitride-containing silicon oxide layer containing SisOtNu
Implementation Method 2
introducing nitrogen-containing gas when the silicon-nitride-containing silicon oxide layer is formed on the optical base by a deposition
Data Source
AI summary
An optical article includes: an optical base; and a layer that is provided on the optical base and contains SiO2 as a main component, the layer being a silicon-nitride-containing silicon oxide layer containing SisOtNu (s>0, T≧0, u>0).