Silicon Oxide Sealing Layer for Organic EL Devices

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Solution Overview

Problem

Conventional organic EL display devices have complex manufacturing processes and high costs due to the use of lasers for forming glass frits, which complicates the sealing process and reduces yield, leading to increased costs and reduced barrier properties.

Innovation Solution

An electroluminescent device with a sealing layer comprising one or more silicon oxide films, where the degree of oxidation is set between 1.2 and 1.8, providing excellent barrier properties while being inexpensive and easy to manufacture, and including an organic film to enhance durability and transmittance.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If glass frit is formed using a laser to improve barrier properties, then sealing quality is improved, but manufacturing complexity increases and cost increases

Engineering Contradiction:
Improvebarrier propertiesVSAvoidmanufacturing process complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent extracts the laser processing step from the manufacturing process and replaces it with a simpler coating process. The sealing layer is applied as a coating material that is then heated to form the seal, eliminating the need for complex laser equipment and processing while achieving comparable or superior barrier properties through the controlled oxidation of silicon oxide films.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent changes the chemical composition parameters of the sealing layer by controlling the degree of oxidation of silicon oxide films to be 1.2 or more and 1.8 or less. This parameter optimization allows the material to achieve excellent barrier properties without requiring laser processing, thereby simplifying the manufacturing process while maintaining reliability.

Inventive Principle:
Principle #35Parameter changes

2Reliability

If glass frit is formed using a laser to improve barrier properties, then sealing quality is improved, but manufacturing cost increases

Engineering Contradiction:
Improvebarrier propertiesVSAvoidmanufacturing cost
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent replaces expensive laser processing equipment and operations with a more economical coating and heating process. The sealing layer uses silicon oxide films with controlled oxidation degrees that can be applied through standard coating techniques and cured with conventional heating, significantly reducing equipment investment and operational costs while maintaining excellent barrier properties.

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

By optimizing the degree of oxidation parameter of silicon oxide films (1.2 ≤ oxidation degree ≤ 1.8), the patent achieves excellent barrier properties through material composition control rather than expensive processing methods. This parameter-based solution reduces manufacturing costs by eliminating laser equipment requirements while maintaining high sealing quality.

Inventive Principle:
Principle #35Parameter changes

3Ease of manufacture

If conventional sealing methods are used, then manufacturing is simpler, but barrier properties are insufficient

Engineering Contradiction:
Improvemanufacturing simplicityVSAvoidbarrier properties
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent employs a composite sealing layer structure consisting of silicon oxide films with controlled oxidation degrees (1.2 ≤ oxidation degree ≤ 1.8) combined with organic EL elements. This composite material approach achieves excellent barrier properties against moisture and oxygen while maintaining compatibility with simple manufacturing processes, as the sealing layer can be applied through conventional coating methods followed by standard heating procedures.

Inventive Principle:
Principle #40Composite materials

Solution Approach 2:

The patent improves barrier properties by precisely controlling the oxidation degree parameter of silicon oxide films within the range of 1.2 to 1.8. This parameter optimization enhances the sealing performance without complicating the manufacturing process, as the controlled oxidation can be achieved through standard heating treatments applied to the coated sealing layer.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The solution results in an electroluminescent device that is cost-effective, easy to manufacture, and offers superior barrier properties, preventing moisture and oxygen ingress, and maintaining high transmittance and brightness even when bent.

Implementation Method 1

the sealing layer includes one or more silicon oxide films... a degree of oxidation of at least one of the one or more silicon oxide films is set to 1.2 or more and 1.8 or less... excellent barrier properties... preventing moisture and oxygen ingress

Methodology Applied
Scientific EffectPermeation: Permeation

Implementation Method 2

an organic film is provided on the silicon oxide film in the sealing layer... prevent the occurrence of defects such as peeling of the sealing layer even if the electroluminescent device is bent

Methodology Applied
Scientific EffectAdhesion: Adhesive

Data Source

PatentUS10608203B2Silicon oxide sealing layer for electroluminescent device
Publication Date: 2020.03.31 SHARP KK
  • US10608203B2 patent drawing
  • US10608203B2 patent drawing
  • US10608203B2 patent drawing

AI summary

An organic EL display device includes a substrate and an organic EL element (electroluminescent element) provided on the substrate. The organic El display device includes a sealing layer that seals the organic EL element. The sealing layer includes silicon oxide films. Moreover, the degree of oxidation of the silicon oxide films is set to 1.2 or more and 1.8 or less.