Silicon Photonics Deflection Device for High Beam Quality

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Solution Overview

Problem

Existing optical deflection devices face challenges in achieving high beam quality and wide angular range deflection while being compatible with silicon photonics technology, as mechanical mirror devices are unreliable, phase array devices suffer from multi-peak profiles, and waveguides with diffraction gratings have limited scanning angles and resolution.

Innovation Solution

A silicon photonics-based optical deflection device with a periodic structure that includes a slow light waveguide and a diffraction grating, where the slow light waveguide is formed using a photonic crystal and the diffraction grating is embedded in a cladding, allowing for high beam quality and wide angular range deflection by controlling the wavelength and refractive index.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Device complexity

If a mechanical mirror configuration is used, then the device structure is simple, but the reliability is low and operation speed is limited to kHz-order

Engineering Contradiction:
Improvedevice structureVSAvoidreliability
Core Design Contradiction:
Device complexityVSReliability

Solution Approach 1:

The patent replaces mechanical mirror systems with a photonic crystal waveguide system that uses optical interference and diffraction effects. The beam deflection is achieved through phase modulation of light waves in an integrated photonic circuit, eliminating all mechanical moving parts while enabling high-speed operation at the limit of light modulation speed.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

2Reliability

If a phase array configuration is used, then the reliability improves by eliminating movable parts, but the beam quality deteriorates due to multi-peak profile

Engineering Contradiction:
ImprovereliabilityVSAvoidbeam quality
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent employs a photonic crystal structure where the refractive index is locally modulated in a periodic pattern. This local structural quality control enables precise phase manipulation of light waves, creating a single dominant diffraction order with high beam quality while maintaining the reliability of a non-mechanical system.

Inventive Principle:
Principle #3Local quality

3Ease of manufacture

If a waveguide with diffraction grating is used, then the manufacturing compatibility improves, but the beam scanning angle and resolution are limited

Engineering Contradiction:
Improvemanufacturing compatibilityVSAvoidbeam scanning angle
Core Design Contradiction:
Ease of manufactureVSAdaptability or versatility

Solution Approach 1:

The patent utilizes the slow light effect by operating near the photonic band edge, where the group velocity of light is significantly reduced. This parameter change in light propagation speed enhances the sensitivity of the diffraction grating, enabling large beam scanning angles and high resolution while maintaining compatibility with standard silicon photonics manufacturing processes.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The device achieves high beam quality and wide angular range deflection with improved reliability and compatibility with silicon photonics, enabling efficient two-dimensional beam scanning and increased resolution points.

Implementation Method 1

a periodic structure that generates slow light

Methodology Applied
Scientific EffectSlow light: Photonic Crystal

Implementation Method 2

a periodic structure that radiates light

Methodology Applied
Scientific EffectDiffraction: Diffraction

Implementation Method 3

optical waveguide layer

Methodology Applied
Scientific EffectTotal internal reflection: Total Internal Reflection

Data Source

PatentUS11079541B2Optical deflection device and LIDAR apparatus
Publication Date: 2021.08.03 NAT UNIV CORP YOKOHAMA NAT UNIV
  • US11079541B2 patent drawing
  • US11079541B2 patent drawing
  • US11079541B2 patent drawing

AI summary

An optical deflection device that achieve both high beam quality and wide angular range of deflection and compatibility with an optical integration technology of silicon photonics. The optical deflection device is a silicon photonics device including a periodic structure of a refractive index. The optical deflection device includes two configurations, which are (1) a configuration in which an optical propagation part where light propagates is a microstructure formed on silicon, and (2) a configuration in which the microstructure constituting the optical propagation part includes a periodic structure that generates slow light and a periodic structure that radiates light. The microstructure formed on the silicon of (1) makes it possible to employ the optical integration technology of silicon photonics and form the optical deflection device. The two periodic structures of (2) make it possible to form a light beam with high beam quality and a wide angular range of deflection.