Silicon Polymer Purification via Gel Cation Resin

Solution Overview

Problem

Existing methods for purifying silicon-containing polymers in semiconductor lithography fail to efficiently reduce metal impurities while minimizing changes in weight average molecular weight, leading to defects in semiconductor devices.

Innovation Solution

Treatment of silicon-containing polymer compositions with a gel type strongly acidic cation exchange resin, specifically using a sulfonate group functional group, to reduce metal impurities and maintain molecular weight stability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If ion exchange resin is used to remove metal impurities, then metal impurity reduction is achieved, but polymerization of alkoxysilane is promoted causing modification of the compound to be purified

Engineering Contradiction:

Improvemetal impurity reductionVSAvoidcompound modification

Core Design Contradiction:

Manufacturing precisionVSStability of the object's composition

Solution Approach 1:

The patent applies local quality by selecting a specific type of ion exchange resin (gel type with sulfonate groups) that has localized acidic properties. This specific resin structure provides metal impurity removal capability while minimizing unwanted polymerization reactions, thus resolving the contradiction between purification effectiveness and compound stability.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The patent changes the parameters of the ion exchange resin system by specifying gel type structure with sulfonate functional groups. This parameter specification transforms the general ion exchange process into a controlled system that removes metal impurities without promoting alkoxysilane polymerization, thereby maintaining compound integrity.

Inventive Principle:

Principle #35Parameter changes

2Productivity

If distillation is used to remove metal impurities, then purification efficiency is improved, but it cannot be applied when the compound is solid, has high boiling point, or is unstable to heat

Engineering Contradiction:

Improvepurification efficiencyVSAvoidapplicability to various compounds

Core Design Contradiction:

ProductivityVSAdaptability or versatility

Solution Approach 1:

The patent uses ion exchange resin as an intermediary substance that facilitates metal impurity removal without requiring the compound to undergo phase changes or thermal stress. This mediator approach enables purification of solids and heat-sensitive compounds that cannot be processed by direct distillation, greatly enhancing method versatility.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Manufacturing precision

If general ion exchange resin is used, then metal impurity removal is achieved, but catalytic promotion of polymerization occurs

Engineering Contradiction:

Improvemetal impurity contentVSAvoidpolymerization side reaction

Core Design Contradiction:

Manufacturing precisionVSObject-generated harmful factors

Solution Approach 1:

The patent applies local quality by selecting a specific type of ion exchange resin (gel type with sulfonate groups) that has localized acidic properties. This specific resin structure provides metal impurity removal capability while minimizing unwanted polymerization reactions, thus resolving the contradiction between purification effectiveness and compound stability.

Inventive Principle:

Principle #3Local quality

Solution Approach 2:

The patent changes the parameters of the ion exchange resin system by specifying gel type structure with sulfonate functional groups. This parameter specification transforms the general ion exchange process into a controlled system that removes metal impurities without promoting alkoxysilane polymerization, thereby maintaining compound integrity.

Inventive Principle:

Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This method effectively reduces metal impurities to 1 ppb or less and limits weight average molecular weight change to 70 or less, enhancing the purity and stability of silicon-containing polymers for semiconductor lithography.

Implementation Method 1

treating a silicon-containing polymer composition to be treated containing an organic solvent with a gel type cation exchange resin, so as to reduce a weight average molecular weight change (ΔMw) of the silicon-containing polymer

Methodology Applied

Scientific EffectIon exchange: Ion Exchange

Data Source

PatentUS20220297109A1Method for producing silicon-containing polymer composition

Publication Date: 2022.09.22 NISSAN CHEM CORP

AI summary

A purification method for a silicon-containing polymer composition capable of reducing metal impurities in a silicon-containing polymer composition to be treated, while suppressing the weight average molecular weight change before and after the treatment, by treating the silicon-containing polymer composition containing the metal impurities with an ion exchange resin having a specific structure; a silicon-containing polymer composition; and a method for producing a semiconductor device. A purification method for a silicon-containing polymer composition reduced in weight average molecular weight change before and after treatment, said method being treating a silicon-containing polymer composition to be treated containing an organic solvent with an gel-type cation exchange resin. The weight average molecular weight change before and after the treatment is 70 or less. The ion exchange resin preferably has a strongly acidic functional group. The total residual amount of 24 metal elements after the ion exchange treatment is 1 ppb or less.