Silicon Purification Device With Inclined Flow Plates

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Solution Overview

Problem

Current silicon purification methods for solar cells are costly due to high energy consumption, silicon loss, and low mass transfer of impurities from liquid silicon to gas, limiting the efficiency and cost-effectiveness of the purification process.

Innovation Solution

A silicon purification device with inclined flow plates that have multiple changes of direction and a gas flow perpendicular to the liquid silicon flow, creating a vortex that enhances impurity transport, reducing device volume, energy consumption, and silicon loss while maintaining purification speed.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional purification processes (fluidized bed reactor, distillation) are used, then high-purity silicon is produced, but production costs are high due to investment, energy consumption, and waste reprocessing

Engineering Contradiction:
Improvesilicon purityVSAvoidproduction cost
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The invention changes the physical parameters of the purification process by using a vertical downward flow configuration with specific velocity ranges (0.1-10 m/s) and temperature conditions (1400-1900°C), replacing conventional horizontal or fluidized bed configurations. This parameter optimization enables metallurgical-grade purification at lower costs while achieving solar-grade purity

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The invention extracts and removes specific impurities (boron and phosphorus) from silicon through selective evaporation and mass transfer mechanisms. By focusing on removing these key contaminants through controlled gas flow and temperature gradients, the process achieves high purity without requiring multiple complex purification stages, thereby reducing overall production costs

Inventive Principle:
Principle #2Taking out (Extraction)

2Manufacturing precision

If vacuum evaporation and gas blowing refining are used for phosphorus and boron removal, then purification is achieved, but the process is limited by mass transfer velocity in liquid phase, evaporation rate, and gas phase mass transfer

Engineering Contradiction:
Improveimpurity removal efficiencyVSAvoidpurification velocity
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The invention introduces dynamic gas flow through the liquid silicon at controlled velocities (0.1-10 m/s), creating continuous motion and turbulence that enhances mass transfer. The gas flow dynamically interacts with the liquid phase, preventing stagnant zones and maintaining high purification velocity throughout the process

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The invention uses gas flow (pneumatic action) passing through the liquid silicon to enhance impurity removal. The gas flow creates bubbles and turbulence that increase the interfacial area for mass transfer between liquid and gas phases, significantly accelerating phosphorus and boron removal rates beyond conventional static or slow-flow methods

Inventive Principle:
Principle #29Pneumatics and hydraulics

3Manufacturing precision

If low thickness silicon flows under reduced pressure are used, then purification is enhanced, but the process becomes expensive and not commercially viable

Engineering Contradiction:
Improvepurification qualityVSAvoidcommercial viability
Core Design Contradiction:
Manufacturing precisionVSEase of manufacture

Solution Approach 1:

The invention optimizes pressure parameters to operate at or near atmospheric conditions rather than requiring high vacuum systems. By adjusting temperature, gas flow velocity, and residence time parameters, the process achieves effective purification without the high capital and operational costs associated with maintained vacuum systems, enabling commercial viability

Inventive Principle:
Principle #35Parameter changes

4Ease of operation

If conventional flow plate geometry is used, then device operation is simple, but mass transfer of impurities from liquid silicon to gas is low and silicon loss and energy consumption are high

Engineering Contradiction:
Improvedevice operation simplicityVSAvoidmass transfer efficiency
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The invention uses vertical flow plates with downward curvature that guide the liquid silicon flow in an arc rather than a straight line. This curved geometry increases the residence time of liquid silicon in the reaction zone, enhances gas-liquid contact area, and improves mass transfer efficiency without complicating the device structure or operation

Inventive Principle:
Principle #14Spheroidality (Curvature)

Solution Approach 2:

The invention transitions from horizontal or flat flow plate configurations to vertical downward flow with three-dimensional curvature. This dimensional change creates a longer effective path length and increased surface area for mass transfer within a compact device volume, improving efficiency while maintaining operational simplicity

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The optimized geometry of the device achieves higher impurity transfer efficiency with lower gas and energy consumption, resulting in a more cost-effective and efficient purification process for producing high-purity silicon for solar cells.

Implementation Method 1

the friction of the gas has a positive effect because it induces a vortex in the liquid silicon and thus increases the transport of the impurities from the liquid silicon to the gas

Methodology Applied
Scientific EffectVortex: Vortex Ring

Implementation Method 2

means for supplying on each flow plate a gas for evacuating silicon impurities

Methodology Applied
Scientific EffectEvaporation: Evaporation

Data Source

PatentEP3253711B1Silicon purification device
Publication Date: 2019.10.16 CENT NAT DE LA RECH SCI (C N R S)
  • EP3253711B1 patent drawingFigure 1~2
  • EP3253711B1 patent drawingFigure 3a~3b
  • EP3253711B1 patent drawingFigure 3c~3d

AI summary

The invention is related to a silicon purification device, characterized in that it comprises: - means (15,3) for supplying liquid silicon, - at least one inclined flow plate (5) supplied with the liquid silicon, each flow plate (5) including a path for the liquid silicon flow, the path comprising several changes of direction, and - means (11,10) for supplying on each flow plate (5) a gas for evacuating silicon impurities counter to the liquid silicon flow.