Silicon Speciation in Phosphoric Acid via Inline Chromatography

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Solution Overview

Problem

Current methods for analyzing silicon species in phosphoric acid, such as ICP instruments, struggle with precise control of etching processes due to the inability to distinguish between inorganic and organic silicon species, leading to imprecise concentration measurements and potential damage during semiconductor fabrication.

Innovation Solution

An automated system employing inline chromatographic separation and ICP analytical systems to speciate silicon species in phosphoric acid, allowing for precise determination of individual silicon species concentrations and ratios, enabling precise control of etching processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If ICP instruments are used to analyze silicon species in phosphoric acid, then total silicon concentration can be measured, but the ability to distinguish between inorganic and organic silicon species is lost

Engineering Contradiction:
Improvesilicon species concentration measurementVSAvoidsilicon species differentiation
Core Design Contradiction:
Measurement precisionVSLoss of information

Solution Approach 1:

The patent applies segmentation by separating the analysis into two distinct measurement modes: a first wavelength specific to inorganic silicon species and a second wavelength specific to organic silicon species. This allows the system to measure each species independently while using the same ICP instrument, thereby resolving the contradiction between obtaining precise concentration measurements and maintaining species differentiation information.

Inventive Principle:
Principle #1Segmentation

2Manufacturing precision

If traditional analysis methods are used, then equipment complexity is low, but manufacturing precision of semiconductor fabrication is compromised

Engineering Contradiction:
Improveetching process controlVSAvoidanalysis system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent implements universality by enabling a single ICP instrument to perform multiple functions: measuring inorganic silicon species at one wavelength and organic silicon species at another wavelength. This multi-functionality allows precise etching process control through accurate silicon species differentiation without requiring separate specialized instruments for each measurement type, thus improving manufacturing precision while managing device complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Reliability

If silicon concentration is not precisely controlled, then analysis is simpler, but damage during semiconductor fabrication occurs

Engineering Contradiction:
Improvesemiconductor fabrication safetyVSAvoidetching process control
Core Design Contradiction:
ReliabilityVSEase of operation

Solution Approach 1:

The patent applies feedback by continuously monitoring silicon species concentrations in phosphoric acid using the dual-wavelength ICP method and using this information to control the etching process. The system measures the concentrations of inorganic and organic silicon species separately and uses this feedback to maintain optimal silicon concentration levels, preventing damage to semiconductor wafers while enabling precise operational control.

Inventive Principle:
Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system provides accurate speciation of silicon species, enabling precise control of etching processes, improving the quality and yield of semiconductor fabrication by maintaining optimal silicon concentrations in phosphoric acid.

Implementation Method 1

transferring the fluid sample to an inline chromatographic separation system; separating the inorganic silicon from the bound silicon via the inline chromatographic separation system

Methodology Applied
Scientific EffectChromatography: Chromatography

Implementation Method 2

ICP spectrometry employs electromagnetically generated partially ionized argon plasma which reaches a temperature of approximately 7,000K. When a sample is introduced to the plasma, the high temperature causes sample atoms to become ionized or emit light.

Methodology Applied
Scientific EffectPlasma ionization: Plasma

Implementation Method 3

When a sample is introduced to the plasma, the high temperature causes sample atoms to become ionized or emit light. Since each chemical element produces a characteristic mass or emission spectrum, measuring the spectra of the emitted mass or light allows the determination of the elemental composition of the original sample.

Methodology Applied
Scientific EffectAtomic emission: Luminescence

Data Source

PatentUS11249057B2Automated system for detection of silicon species in phosphoric acid
Publication Date: 2022.02.15 ELEMENTAL SCI
  • US11249057B2 patent drawing
  • US11249057B2 patent drawing
  • US11249057B2 patent drawing

AI summary

Systems and methods are described to provide speciation of silicon species present in a remote sample for analysis. A method embodiment includes, but is not limited to, receiving a fluid sample containing inorganic silicon in the presence of bound silicon from a remote sampling system via a fluid transfer line; transferring the fluid sample to an inline chromatographic separation system; separating the inorganic silicon from the bound silicon via the inline chromatographic separation system; transferring the separated inorganic silicon and bound silicon to a silicon detector in fluid communication with the inline chromatographic separation system; and determining an amount of one or more of the inorganic silicon or the bound silicon in the fluid sample via the silicon detector.