Silicon Underlayer Composition for Vertical Block Copolymer Alignment
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Solution Overview
Problem
There is a demand for a technique that induces a microphase-separated structure of a block copolymer-containing layer perpendicularly with respect to a substrate, particularly for forming a self-assembled film with a desired vertical pattern in semiconductor device production, where existing methods face challenges with alignment due to surface irregularities and hydrophilicity issues.
Innovation Solution
A silicon-containing underlayer film-forming composition comprising polysiloxane and solvent, without strongly acidic additives, is used to form a self-assembled pattern, which enables the induction of a microphase-separated structure perpendicularly to the substrate, addressing alignment and hydrophilicity challenges.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional underlayer film composition containing strongly acidic additives is used, then the film can be formed on the substrate, but the surface irregularities and hydrophilicity cause misalignment of the self-assembled pattern
Solution Approach 1:
The invention changes the chemical composition parameters of the underlayer film by excluding strongly acidic additives (such as carboxylic acid groups) from the polymer composition. This parameter change modifies the surface properties to reduce hydrophilicity and surface irregularities, thereby improving alignment precision of the self-assembled pattern without sacrificing film formation capability
Solution Approach 2:
The invention uses a composite polymer composition consisting of multiple polymer components (including polymers with specific functional groups like hydroxyl, ether, or ester groups) to achieve the desired surface properties. This composite approach allows tuning of surface hydrophilicity and irregularity while maintaining film integrity and adhesion to the substrate
2Strength
If the underlayer film surface is made more hydrophilic to improve adhesion, then the film adheres better to the substrate, but the self-assembled pattern alignment is degraded due to increased surface irregularities
Solution Approach 1:
The invention applies local quality control by selecting specific polymer functional groups (such as hydroxyl, ether, or ester groups) that provide moderate hydrophilicity for adequate adhesion while minimizing surface irregularities. This localized optimization of surface properties at specific functional group levels achieves a balance between adhesion strength and alignment precision
Solution Approach 2:
The invention changes the surface energy parameters by excluding strongly acidic groups and using polymers with controlled hydrophilic functional groups. This parameter adjustment optimizes the balance between adhesion (requiring some hydrophilicity) and alignment (requiring smooth, uniform surface), achieving both goals simultaneously
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition effectively forms a self-assembled film with a desired vertical pattern, improving alignment and reducing misalignment issues by controlling surface hydrophilicity and hydrophobicity, thus enhancing the precision of semiconductor device production.
Implementation Method 1
a self-assembled film formed from a block copolymer and having a nanoscale repeating structure
Implementation Method 2
phase-separated structure formed through self-assembly of a block copolymer
Data Source
AI summary
A silicon-containing underlayer film-forming composition that can form a self-assembled film wherein a desired vertical pattern is induced, and a pattern formation method using the composition. A composition for forming a silicon-containing underlayer film for a self-assembled film, the composition being characterized by including: a polysiloxane; and a solvent, but not including a strongly acidic additive.