Silicon Watch Part Optical Illusion Etching
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Solution Overview
Problem
Existing manufacturing processes for silicon-based parts require faceting or retouching to achieve optical illusion patterns, which are complex and lack precision and reproducibility.
Innovation Solution
A process involving anisotropic etching of a silicon-based layer with a mask to create through-holes and blind recesses, allowing for the formation of optical illusion patterns that simulate faceting or chamfering without actual machining, enabling high precision and reproducibility in producing flat surfaces that appear non-flat.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If faceting or retouching is used to create optical illusion patterns, then the aesthetic effect is achieved, but the manufacturing complexity and post-processing requirements increase
Solution Approach 1:
The patent applies preliminary action by forming the optical illusion pattern directly during the initial etching process rather than through subsequent faceting or retouching operations. The mask is designed with specific geometries that create the desired optical illusion effect as the part is being manufactured, eliminating the need for post-processing steps.
Solution Approach 2:
The patent extracts the optical illusion pattern creation from the post-processing stage and integrates it into the primary manufacturing process. By removing the separate faceting or retouching steps and incorporating the pattern formation into the etching operation itself, the manufacturing complexity is reduced while maintaining high precision.
2Productivity
If traditional etching methods are used, then the basic part shape is formed, but the optical illusion patterns require additional processing steps
Solution Approach 1:
The patent merges the formation of the part shape and the optical illusion pattern into a single etching operation. The mask design allows both the through-holes and the optical illusion patterns to be created simultaneously during one etching process, improving productivity by eliminating multiple processing steps.
Solution Approach 2:
The etching process is made multi-functional by designing the mask to serve dual purposes: defining the part outline and creating the optical illusion patterns. This universal approach allows one process to accomplish what previously required multiple specialized operations.
3Reliability
If multiple processing steps are used to create optical illusion patterns, then the patterns can be formed, but the reproducibility and dimensional accuracy decrease
Solution Approach 1:
By performing the pattern formation in advance during the initial etching step, the patent ensures consistent reproduction of optical illusion patterns. The mask geometry is precisely defined beforehand, allowing for high reproducibility across multiple parts without variation introduced by subsequent manual or automated retouching operations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The process achieves high dimensional accuracy and reproducibility, allowing for the creation of simple silicon-based parts with fine, easily reproducible patterns that simulate machining effects like beveling or chamfering without the need for post-processing, offering a cost-effective and precise method for producing parts with optical illusion patterns.
Implementation Method 1
an etching phase using at least one anisotropic etch of this silicon-based layer
Data Source
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AI summary
The invention relates to a method for manufacturing a single-piece piece of simple shape made from silicon offering the illusion of faceting and/or chamfering to form all or part of the casing of a watch part.