Silicon Waveguide PN Junction Layout for Higher Modulation Overlap

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Solution Overview

Problem

The modulation efficiency of silicon PN junction phase shifters in optoelectronic devices is limited by the overlap between the optical mode and the PN junction area.

Innovation Solution

An optoelectronic device is designed with an optical waveguide in a silicon-on-insulator wafer, featuring a semiconductor junction with a first doped region extending horizontally and vertically over a second doped region, and a third portion protruding as a salient into the second doped region, increasing the junction length within the optical mode area.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Productivity

If a conventional symmetrical PN junction structure is used, then the device structure is simple and easy to manufacture, but the overlap between the optical mode and the PN junction area is limited, reducing modulation efficiency

Engineering Contradiction:
Improvemodulation efficiencyVSAvoidjunction structure complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The patent applies asymmetry by designing an asymmetric PN junction structure where the first doped region extends beyond the second doped region to form a salient protrusion. This asymmetric configuration increases the overlap area between the optical mode and the PN junction, thereby improving modulation efficiency while maintaining manufacturability through standard doping processes.

Inventive Principle:
Principle #4Asymmetry

Solution Approach 2:

The patent extends the first doped region in multiple spatial dimensions - horizontally on top of the second doped region, vertically along its lateral side, and protruding into it to form a salient. This multi-dimensional extension maximizes the junction overlap with the optical mode volume, resolving the contradiction between simple structure and high modulation efficiency.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Productivity

If the PN junction area is increased to improve optical mode overlap, then modulation efficiency improves, but the device area and manufacturing complexity increase

Engineering Contradiction:
Improvemodulation efficiencyVSAvoiddevice area
Core Design Contradiction:
ProductivityVSArea of stationary object

Solution Approach 1:

The patent applies local quality by concentrating the doped regions precisely where the optical mode intensity is highest. The first doped region is strategically positioned to overlap with the optical mode area, creating high doping concentration zones exactly where they are most effective for modulation, rather than uniformly distributing doping throughout the device.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The patent employs a nested configuration where the first doped region is partially contained within the vertical projection of the second doped region, while also extending beyond it. The salient protrusion of the first doped region into the second doped region creates a nested arrangement that maximizes overlap volume without proportionally increasing the overall device footprint.

Inventive Principle:
Principle #7Nested doll (Nesting)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration enhances the overlap between the optical mode and the semiconductor junction, thereby improving the modulation efficiency of the optoelectronic device.

Implementation Method 1

Optical modulation of light in a silicon waveguide is known, including waveguide modulators based upon: electro-optic, quantum confined Stark, Franz-Keldysh, and carrier plasma dispersion

Methodology Applied
Scientific EffectElectro-optic effect: Electro-Optic Effects

Implementation Method 2

a semiconductor junction comprising: a first doped region of semiconductor material; and a second doped region of semiconductor material, the second doped region containing dopants of a different species to the first doped region

Methodology Applied
Scientific EffectPN junction electric field: Electric Field

Data Source

PatentUS12292624B2Optoelectronic device and method of manufacturing an optoelectronic device
Publication Date: 2025.05.06 ROCKLEY PHOTONICS LTD
  • US12292624B2 patent drawing
  • US12292624B2 patent drawing
  • US12292624B2 patent drawing

AI summary

An optoelectronic device comprising an optical waveguide formed in a silicon device layer of a silicon-on-insulator wafer. The optical waveguide including a semiconductor junction comprising a first doped region of semiconductor material and a second doped region of semiconductor material. The second doped region containing dopants of a different species to the first doped region. A first portion of the first doped region extends horizontally on top of the second doped region, a second portion of the first doped region extends vertically along a lateral side of the second doped region and a third portion of the first doped region protrudes as a salient from the first or second portion of the first doped region into the second doped region.