Silicone Polymer Resist for Delamination Prevention
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Solution Overview
Problem
Current chemically amplified negative resist compositions face challenges in forming uniform layers on substrates with uneven surfaces, leading to delamination issues and poor pattern resolution due to insufficient adhesiveness and high viscosity, which affects the formation of fine patterns with high aspect ratios and concavity/convexity structures required in advanced semiconductor technologies.
Innovation Solution
A silicone skeleton-containing polymer compound is developed, which serves as a base resin for a chemically amplified negative resist composition, enhancing adhesiveness and crosslinking reactivity to prevent delamination and improve pattern resolution, allowing for the formation of fine patterns on substrates with complex geometries using a spin coating method.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If the film thickness exceeds about 30 μm, then the photo-curable resin composition can provide sufficient coverage, but the viscosity becomes too high to form a film on a substrate by the spin coating method
Solution Approach 1:
The patent changes the chemical composition parameters of the resin system by incorporating silicone skeleton-containing polymer compounds with specific molecular structures and functionalities, which modify the viscosity-thickness relationship to enable coating of thicker films at manageable viscosity levels
Solution Approach 2:
The patent uses composite resin compositions combining multiple polymer components including silicone skeleton-containing polymers, epoxy resins, and crosslinking agents to achieve a balanced formulation that provides both low enough viscosity for spin coating and sufficient thickness for adequate coverage
2Ease of manufacture
If the photo-curable resin composition is applied onto a substrate having an uneven surface by spin coating, then a film can be formed, but it is difficult to form a uniform layer and voids generate on the uneven part
Solution Approach 1:
The patent modifies the rheological parameters of the resin composition by adjusting viscosity and adding flow control agents, enabling the material to flow into and fill uneven substrate surfaces during spin coating, then stabilize to form uniform layers without voids
Solution Approach 2:
The silicone skeleton-containing polymer acts as an intermediary substance that mediates between the coating process and the uneven substrate surface, providing both flowability to conform to surface variations and structural integrity to maintain uniformity after deposition
3Manufacturing precision
If a chemically amplified negative resist composition is used to obtain fine patterns, then pattern resolution improves, but adhesiveness between the resist composition and substrates is not sufficient, causing delamination
Solution Approach 1:
The patent creates a composite resist composition that integrates silicone skeleton-containing polymers with traditional chemically amplified negative resist components, combining the fine pattern formation capability of chemically amplified resins with the superior adhesion properties of silicone-based materials
Solution Approach 2:
The patent introduces specific functional groups and molecular structures in the silicone skeleton-containing polymer that provide localized adhesion enhancement at the substrate-resist interface while maintaining the overall chemically amplified negative resist characteristics for fine pattern resolution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The silicone skeleton-containing polymer compound improves adhesiveness and crosslinking reactivity, enabling the formation of fine patterns with high aspect ratios and concavity/convexity structures without scum or footing profiles, and provides excellent flexibility, heat resistance, and chemical resistance when post-cured, suitable for advanced semiconductor applications.
Implementation Method 1
enhancing adhesiveness and crosslinking reactivity to prevent delamination
Implementation Method 2
chemically amplified negative resist composition
Data Source
AI summary
The present invention provides a silicone skeleton-containing polymer compound containing a repeating unit shown by the general formula (1). There can be provided a silicone skeleton-containing polymer compound suitable used as a base resin of a chemically amplified negative resist composition that can remedy the problem of delamination generated on a metal wiring such as Cu and Al, an electrode, and a substrate, especially on a substrate such as SiN, and can form a fine pattern without generating a scum and a footing profile in the pattern bottom and on the substrate.