Siloxane-Based Compound Adhesion in High-Resolution Color Filter Photoresist
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Solution Overview
Problem
In the manufacturing of high-resolution color filters for liquid crystal display devices, the adhesion between photoresist thin films and substrates is insufficient, leading to pattern defects during development due to the risk of thin film loss.
Innovation Solution
A siloxane-based compound is incorporated into a photosensitive composition, along with a crosslinkable compound, an alkali soluble binder resin, a photopolymerization initiator, and a solvent, to enhance adhesion and reduce the likelihood of thin film loss during pattern development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the size of color pixel, black matrix, column spacer is decreased to increase resolution, then the resolution of color filter is improved, but the adhesion between photoresist thin film and substrate becomes insufficient
Solution Approach 1:
The patent introduces a siloxane-based compound with specific molecular structure (Formula 1) containing alkoxy groups, alkyl groups, and siloxane bonds. This chemical parameter change in the photoresist composition enhances adhesion to the substrate while maintaining the ability to form fine patterns for high resolution color filters
Solution Approach 2:
The patent creates a composite photoresist system by combining the siloxane-based compound (Formula 1) with a crosslinkable compound having two or more ethylenically unsaturated bonds. This composite material provides both improved adhesion through siloxane groups and pattern fidelity through crosslinking, resolving the contradiction between high resolution and adhesion
2Manufacturing precision
If a conventional photoresist is used for high resolution patterns, then the pattern size is reduced, but the thin film is lost during development process
Solution Approach 1:
The siloxane-based compound is incorporated into the photoresist composition before pattern formation. The siloxane groups establish strong adhesion to the substrate in advance, preventing thin film loss during the subsequent development process while enabling high resolution patterning
Solution Approach 2:
The siloxane-based compound acts as an intermediary between the photoresist thin film and the substrate. The siloxane groups provide chemical bonding capability that mediates the adhesion interface, ensuring pattern integrity during development while maintaining the ability to form small-sized patterns
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The use of the siloxane-based compound in the photosensitive composition improves adhesion and reduces the risk of pattern loss, even for small-sized patterns, maintaining excellent adhesion and preserving pattern integrity during development.
Implementation Method 1
a photopolymerization initiator
Data Source
AI summary
The present application relates to a siloxane-based compound, a photosensitive composition including the same, and a photosensitive material.