Photosensitive Resin With Siloxane-Coated Quantum Dots for Fine Lithography
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Solution Overview
Problem
Existing photosensitive resin compositions struggle to achieve high lithography resolution and favorable luminous properties, particularly in the context of miniaturized micro-LED displays, where further miniaturization and improved display clarity are demanded.
Innovation Solution
A photosensitive resin composition comprising a (meth)acryloyl group-containing resin, a photo-radical generator, and a quantum dot with a surface coating layer containing siloxane, which enhances lithography resolution and luminous properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photosensitive resin compositions are used for lithography patterning, then the patterning process can be completed, but the lithography resolution is insufficient and luminous properties are not favorable
Solution Approach 1:
The patent uses a composite resin system combining (meth)acryloyl group-containing resin with epoxy group-containing resin, creating a material that simultaneously achieves high lithography resolution through the (meth)acryloyl resin's photopolymerization characteristics and favorable luminous properties through the epoxy resin's structural stability and optical properties
Solution Approach 2:
The patent optimizes the molecular weight parameters of the resins, specifically using (meth)acryloyl group-containing resin with weight-average molecular weight of 5,000 to 100,000 g/mol and double bond equivalent of 240 to 1,000 g/mol, to achieve the desired balance between resolution and luminous properties
2Reliability
If quantum dots are added to photosensitive resin composition to improve luminous properties, then luminous properties are enhanced, but quantum dots may escape during developing process
Solution Approach 1:
The patent introduces a siloxane-containing surface coating layer as an intermediary between the quantum dots and the resin matrix. This coating layer acts as a binding interface that anchors quantum dots to the resin structure, preventing their escape during developing while maintaining their luminous properties
Solution Approach 2:
The patent applies a localized surface coating treatment specifically to the quantum dots, giving them different surface properties (siloxane-containing coating) than the bulk resin matrix. This local modification enables quantum dots to be retained in the patterned regions without affecting the overall resin performance
3Volume of moving object
If further miniaturization is pursued for micro-LED displays, then display size is reduced, but lithography resolution requirements become more stringent
Solution Approach 1:
The patent modifies the resin parameters by selecting (meth)acryloyl group-containing resin with specific molecular weight ranges (5,000 to 100,000 g/mol) and double bond equivalents (240 to 1,000 g/mol), which enables the formation of finer patterns with higher lithography resolution required for miniaturized displays
4Manufacturing precision
If high crosslinking density is achieved to improve pattern shape, then pattern shape quality is enhanced, but film quantity may decrease during development
Solution Approach 1:
The patent carefully controls the molecular weight and double bond equivalent parameters of the (meth)acryloyl group-containing resin to achieve an optimal crosslinking density that maintains good pattern shape while preventing excessive film loss during the development process
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of films with high resolution and favorable luminous properties, suitable for patterning processes and light emitting devices, ensuring precise pattern formation and improved display performance.
Implementation Method 1
a photo-radical generator
Implementation Method 2
light from an LED array is converted through a color conversion structure such that blue light having a shorter wavelength is converted to red and green light having longer wavelengths. Quantum dots have been employed for this color conversion.
Implementation Method 3
the quantum dot has a surface coating layer containing siloxane
Data Source
AI summary
The present invention is a photosensitive resin composition including: (A) a (meth)acryloyl group-containing resin; (B) a photo-radical generator; and (C) a quantum dot, wherein the quantum dot has a surface coating layer containing siloxane. This can provide: a photosensitive resin composition capable of easily forming a film having high lithography resolution and favorable luminous properties; a photosensitive resin film obtained by using the photosensitive resin composition; patterning processes using these; and a light emitting device obtained by using the photosensitive resin composition.