Siloxane-Coated Quantum Dot Resin for High-Resolution Micro-LED Patterning
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Solution Overview
Problem
Existing photosensitive resin compositions struggle to achieve high lithography resolution and favorable luminous properties, particularly in the context of miniaturized micro-LED displays, where further miniaturization and improved display clarity are demanded.
Innovation Solution
A photosensitive resin composition comprising a glycidyl group-containing silicone resin, a photocationic polymerization initiator, and a quantum dot with a surface coating layer containing siloxane, which enhances film formation and luminous properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photosensitive resin compositions are used for lithography patterning, then the patterning process can be completed, but the lithography resolution is insufficient and luminous properties are not favorable
Solution Approach 1:
The patent uses a composite resin system combining epoxy resin and cycloaliphatic poly羧酯 resin with specific molecular weight ranges, along with dual-cure mechanism (photopolymerization + polycondensation) to achieve both high resolution patterning and favorable luminous properties in the final product
2Length of moving object
If further miniaturization is pursued for micro-LED displays, then display size is reduced, but achieving high lithography resolution becomes more difficult
Solution Approach 1:
The patent specifies precise parameter ranges for resin molecular weights (epoxy: 500-5000, cycloaliphatic poly羧酯: 1000-10000), quantum dot sizes (2-20 nm), and their ratios to enable lithography patterning at miniaturized dimensions while maintaining high resolution
3Reliability
If quantum dots are used for color conversion, then luminous properties are improved, but quantum dots may escape during the developing process
Solution Approach 1:
The patent applies preliminary surface treatment to quantum dots including silane coupling agent treatment and embedding in a protective matrix formed by photopolymerization and polycondensation reactions, preventing quantum dot escape during subsequent developing processes while preserving luminous properties
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition enables the formation of films with high lithography resolution and favorable luminous properties, suitable for patterning processes and light emitting devices.
Implementation Method 1
a photocationic polymerization initiator
Implementation Method 2
light from an LED array is converted through a color conversion structure such that blue light having a shorter wavelength is converted to red and green light having longer wavelengths. Quantum dots have been employed for this color conversion.
Data Source
AI summary
The present invention is a photosensitive resin composition including (A) a glycidyl group-containing silicone resin, (B) a photocationic polymerization initiator, and (C) a quantum dot, wherein the quantum dot has a surface coating layer containing siloxane. This can provide: a photosensitive resin composition capable of easily forming a film having high lithography resolution and favorable luminous properties; a photosensitive resin film obtained by using the photosensitive resin composition, and a photosensitive dry film; patterning processes using these; and a light emitting device obtained by using the photosensitive resin composition.