Siloxane Resin Composition for OLED Display Pattern Defects
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Solution Overview
Problem
Existing photosensitive resin compositions for OLED display devices suffer from insufficient sensitivity, resolution, and productivity, leading to pattern defects and reduced reliability due to solubility differences and residue issues after development.
Innovation Solution
A positive photosensitive resin composition comprising a siloxane-based copolymer, a 1,2-quinone diazide compound, a UV absorber with specific chemical structures, and a solvent, which minimizes unreacted monomers and catalysts, enhancing sensitivity, resolution, and heat resistance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If polyamic acid compounds are used in photosensitive resin composition, then the resin can form patterns, but the sensitivity is insufficient and thickness change rate is high
Solution Approach 1:
The patent changes the chemical composition parameters by replacing polyamic acid compounds with siloxane resin compounds, which have different photochemical properties. This substitution improves sensitivity and reduces thickness change rate during photolithography processing, directly addressing the contradiction between pattern formation capability and processing efficiency.
Solution Approach 2:
The patent uses composite material design by combining siloxane resin with specific photoacid generators and controlling the molecular structure (using copolymers with specific ratios of silane compounds). This composite approach achieves both good pattern formation and improved productivity characteristics.
2Reliability
If polyimide resin is used in photosensitive resin composition, then the resin provides insulation properties, but residues are generated after development
Solution Approach 1:
The patent changes the resin type from polyimide to siloxane-based materials, which fundamentally alters the solubility and decomposition characteristics. This parameter change eliminates residue formation after development while maintaining the required insulation properties, resolving the contradiction between reliability and harmful residues.
3Productivity
If conventional photosensitive resin composition is used, then the process can be completed, but pattern defects are caused by solubility differences at boundaries
Solution Approach 1:
The patent changes the chemical composition to siloxane resin with controlled molecular weight and structure, which provides more uniform solubility characteristics. This parameter change eliminates solubility differences at exposed/non-exposed boundaries, preventing pattern defects while maintaining efficient process completion.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves excellent insulation, heat resistance, and low moisture absorption, significantly reducing pattern defects and improving the reliability of OLED display devices by forming environment-resistant patterns with enhanced light and heat resistance.
Implementation Method 1
a 1,2-quinone diazide compound; c) one or more kinds of UV absorbers
Implementation Method 2
positive photosensitive resin composition including: a) siloxane-based copolymer; b) a 1,2-quinone diazide compound
Data Source
AI summary
This invention relates to a positive photosensitive resin composition that includes a siloxane copolymer of two kinds of reactive silane compounds with specific structures wherein residual impurities such as unreacted monomers and catalysts are minimized, and a UV absorber including one or more kinds of phenol hydroxyl groups capable of crosslinking and an alkoxy group. Accordingly, the resin composition exhibits excellent performances such as sensitivity, resolution, and degree of planarization, and also has excellent weatherability and UV absorbance, thereby providing excellent panel reliability.