Silphenylene-Polyether Polymer for Crack-Resistant Photosensitive Films
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Solution Overview
Problem
Photosensitive silicone compositions with silphenylene structures suffer from spalling and cracking during thermal cycle tests, indicating a need for improved reliability in protective films for semiconductor devices and multilayer printed circuit boards.
Innovation Solution
A polymer containing a silphenylene structure and a polyether structure in its backbone, with epoxy and/or phenolic hydroxyl groups, and a weight average molecular weight of 3,000 to 500,000, is developed, comprising specific repeating units and synthesized through addition polymerization with a metal catalyst.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If silphenylene structure-containing silicone polymer is used, then chemical resistance is improved, but flexibility and reliability are insufficient
Solution Approach 1:
The patent creates a composite polymer structure where silphenylene units provide chemical resistance and polyether units provide flexibility. The synergistic combination of these two different structural elements resolves the contradiction between chemical resistance and flexibility.
Solution Approach 2:
The patent introduces polyether segments at specific positions within the polymer chain to provide localized flexibility where needed, while maintaining the silphenylene structures that provide chemical resistance in other regions. This local quality modification allows the material to exhibit both properties simultaneously.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The polymer is readily synthesizable and forms a photosensitive composition with enhanced reliability, preventing spalling and cracking in thermal cycles, thus improving the durability of protective films.
Implementation Method 1
synthesized through addition polymerization with a metal catalyst
Data Source
AI summary
A novel polymer containing silphenylene and polyether structures in the backbone is used to formulate a photosensitive composition having improved reliability.