Silver Etchant Composition for Display Device Manufacturing
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Solution Overview
Problem
The silver reducing particle precipitation phenomenon adversely affects the operation of display devices, particularly during the etching process of multilayer films containing silver (Ag) layers.
Innovation Solution
An etchant composition is developed, comprising an inorganic acid compound, an inorganic salt compound, an organic acid compound, a lactate-based compound, a nitrogen cyclic compound containing oxygen, and water, specifically formulated to selectively etch silver (Ag) layers without using phosphoric acid or sulfate-based compounds.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional etching methods are used to etch silver layers, then etching can be performed, but silver reducing particle precipitation occurs which adversely affects device operation
Solution Approach 1:
The patent changes the chemical parameters of the etching solution by specifying precise concentrations of inorganic acid (9.0-9.9 wt%), inorganic salt (5.0-10.0 wt%), organic acid (35-45 wt%), and lactate-based compound (10-20 wt%). These parameter adjustments prevent silver precipitation while maintaining effective etching of the silver layer.
Solution Approach 2:
The patent uses a composite etching solution containing multiple chemical components working together: inorganic acid for etching capability, inorganic salt for silver ion complexation, organic acid for buffering and selectivity control, and lactate-based compound for preventing precipitation. This composite formulation resolves the contradiction between effective etching and precipitation prevention.
2Manufacturing precision
If phosphoric acid or sulfate-based compounds are used for etching, then etching can proceed, but selectivity and control over CD skew deteriorate
Solution Approach 1:
The patent replaces phosphoric acid and sulfate-based compounds with a different chemical system consisting of inorganic acid, inorganic salt, organic acid, and lactate-based compound. This parameter change in chemical composition achieves better selectivity and CD skew control while maintaining manufacturing feasibility.
Solution Approach 2:
The inorganic salt compound acts as an intermediary that complexes with silver ions, controlling the etching rate and improving selectivity. The lactate-based compound serves as another intermediary that prevents precipitation while maintaining etching effectiveness, thereby achieving precise CD skew control.
3Manufacturing precision
If etching is performed on multilayer films containing silver, then metal patterns are formed, but silver precipitation occurs during the process
Solution Approach 1:
The patent adjusts the chemical parameters of the etching solution, particularly the concentration of inorganic salt (5.0-10.0 wt%) and lactate-based compound (10-20 wt%), to prevent silver precipitation during the etching of multilayer films while maintaining effective metal pattern formation.
Solution Approach 2:
The inorganic salt and lactate-based compound act as intermediaries that interact with silver ions during etching, preventing precipitation while allowing controlled removal of silver to form precise metal patterns in the multilayer structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The etchant composition effectively prevents silver precipitation, ensures stable etching performance, and maintains the desired CD skew within the specified range, thereby enhancing the reliability and quality of display device manufacturing.
Implementation Method 1
an etchant composition for selectively etching a metal layer including silver (Ag) among multilayer films including different materials
Implementation Method 2
an inorganic acid compound at 9.0 wt % to 9.9 wt %; an inorganic salt compound at 5.0 wt % to 10.0 wt %... the inorganic acid compound is an etchant composition having an acid dissociation constant (pKa) value of −1.0 to −3.0
Data Source
AI summary
An etchant composition includes: an inorganic acid compound at 9.0 wt % to 9.9 wt %; an inorganic salt compound at 5.0 wt % to 10.0 wt %; an organic acid compound at 35 wt % to 45 wt %; a lactate-based compound at 10 wt % to 20 wt %; a nitrogen cyclic compound containing oxygen at 0.1 wt % to 1.0 wt %; and a remaining amount of water such that a total weight of the etchant composition is 100 wt %, wherein the inorganic acid compound is an etchant composition having an acid dissociation constant (pKa) value of −1.0 to −3.0.