Silver Nanowire Etching via Soluble Complex Formation
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Solution Overview
Problem
Current etching methods for transparent conductive layers comprising silver nanowires are inefficient, as they often result in insoluble silver chloride deposits that damage electronic devices and are difficult to remove, limiting the effectiveness of patterning in applications like touch sensors and displays.
Innovation Solution
An etching composition comprising an oxidizing agent, such as iron (III) chloride or copper (II) salts, combined with ligands like acetic acid, lactic acid, or succinimide, forms water-soluble coordination complexes with silver ions, preventing insoluble silver chloride formation and allowing for effective etching of silver nanowires without damaging the conductive layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If conventional etching methods are used for silver nanowire layers, then etching can be performed, but insoluble silver chloride deposits are formed that damage electronic devices and are difficult to remove
Solution Approach 1:
The patent introduces an intermediary substance (ammonium thioglycolate or ammonium thiosulfate) that mediates between the etching process and the silver chloride formation. This intermediary reacts with the silver ions to form soluble complexes, preventing the formation of insoluble silver chloride deposits while still enabling effective etching of the silver nanowire layer.
Solution Approach 2:
The patent converts the harmful effect of silver chloride formation into a beneficial process by using the reaction products (silver ions) to form soluble complexes with the intermediary substances. Instead of allowing insoluble deposits to form, the harmful silver chloride reaction is redirected to produce soluble complexes that can be easily washed away, transforming a damaging side effect into a controlled and useful etching mechanism.
2Manufacturing precision
If conventional etching methods are used, then pattern formation is attempted, but the reaction products are difficult to remove and limit etching effectiveness
Solution Approach 1:
The patent changes the chemical parameters of the etching composition by adding ammonium thioglycolate or ammonium thiosulfate, which alter the solubility characteristics of the reaction products. This parameter change transforms the insoluble silver chloride deposits into soluble complexes, enabling easy removal through simple washing and significantly improving the ease of operation for pattern formation and cleanup.
3Productivity
If standard etchants are used on silver nanowires, then etching occurs, but the conductive layer is damaged by deposit formation
Solution Approach 1:
The ammonium thioglycolate or ammonium thiosulfate acts as a protective intermediary that maintains conductive layer integrity during etching. These substances form soluble complexes with silver ions at the etching interface, preventing the accumulation of insoluble deposits that would otherwise damage the conductive layer, thereby maintaining both high etching efficiency and layer reliability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The etching composition enables precise patterning of silver nanowire layers, enhancing the production of transparent conductive electrodes by preventing deposition of reaction products and allowing for easy removal, thus improving the manufacturing of electronic devices like touch sensors and displays.
Implementation Method 1
The at least one oxidizing agent may be a first chemical compound that can react with silver to form a silver compound
Implementation Method 2
The at least one ligand may be a second chemical compound that can react with the silver compound to form a water soluble coordination complex of silver ion
Data Source
AI summary
This invention in general relates to a transparent conductive layer comprising a silver nanowire. This invention further relates to an etching composition suitable for etching a transparent conductive layer comprising a silver nanowire to form a pattern. This invention further relates to a transparent conductive electrode manufactured by etching a transparent conductive film comprising a silver nanowire. The etching composition may comprise an oxidizing agent and a ligand. The oxidizing agent may be a first chemical compound that can react with silver metal to form a silver compound; and the ligand may be a second chemical compound that can react with the silver compound to form a water soluble coordination complex of the silver ion.