SIMO Plasma Control Circuit for Uniform Power Distribution
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Solution Overview
Problem
Plasma-based manufacturing systems face power mismatches between electrodes or workstations, leading to non-uniform power distribution and reduced deposition uniformity, despite efforts to rotate workpieces equally through multiple stations.
Innovation Solution
A single input multiple output (SIMO) plasma control system with an electrical splitter and balancing circuit that controls voltage, current, or power flow between each load impedance, ensuring balanced power distribution across multiple plasma chambers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If workpiece rotation through multiple electrodes is implemented to improve deposition uniformity, then throughput increases, but power mismatch between electrodes causes non-uniform power distribution
Solution Approach 1:
The patent applies local quality by implementing individual power control for each electrode through separate RF power supplies and impedance matching networks. Each electrode can be independently tuned to achieve uniform power distribution despite variations in electrode geometry and plasma conditions, thereby maintaining deposition uniformity while enabling high throughput through multiple electrodes
2Manufacturing precision
If multiple RF power supplies are used to control power to each electrode independently, then power distribution uniformity improves, but system complexity increases
Solution Approach 1:
The patent employs a universal control architecture where a single controller manages multiple RF power supplies, impedance matching networks, and measurement systems. This multi-functional control system coordinates all electrodes through centralized logic, reducing operational complexity while maintaining independent power control capability for each electrode
Solution Approach 2:
The patent implements feedback control by measuring actual power delivered to each electrode and using this information to adjust RF power supply settings and impedance matching network parameters. This closed-loop control system automatically compensates for power distribution variations, achieving uniformity without requiring complex manual tuning of each component
Data Source
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AI summary
A single input multiple output plasma control system includes a splitter that receives a single input and generates multiple outputs. Each output from the splitter is provided to a load. The splitter includes branch circuits connected between selected splitter outputs. The branch circuits control voltage, current, power, frequency, or phase between each branch to enable controlling a predetermined relationship between the voltage, current, power, impedance, frequency, or phase measured at each load.