Simulation Calibration Using Defect-Based Process Windows

The patent applies preliminary action by performing calibration of simulation processes before actual manufacturing. This involves determining characteristic limits and reference process windows in advance, adjusting parameter values beforehand, and generating retargeted patterns prior to production. This preliminary calibration ensures simulation accuracy is established before manufacturing begins, preventing defects while managing complexity through structured pre-processing steps.

The patent implements feedback by using measured characteristic limits from actual printed patterns to adjust simulation parameter values. The process window determination provides feedback on acceptable parameter ranges, and retargeted pattern generation uses this feedback to optimize future prints. This closed-loop feedback mechanism improves pattern quality while reducing calibration time by systematically using measurement data to guide parameter adjustments rather than trial-and-error approaches.

The patent replaces complex physical measurement systems with simulation-based approaches. Instead of relying solely on extensive physical experimentation to determine characteristic limits, the method uses calibrated simulation processes with probability density functions to predict and analyze pattern characteristics. This substitution reduces measurement complexity while maintaining productivity by using computational models to guide process optimization.