Simultaneous UV Exposure for Photo-Alignment Layer Formation
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Solution Overview
Problem
The existing photo-alignment processes for forming a light alignment layer in display apparatuses are time-consuming, making them unsuitable for the rapid production needed for portable devices like smartphones and tablets.
Innovation Solution
An exposure apparatus and method that uses a stage with loading, working, and unloading portions, equipped with grippers and an ultraviolet light source, allowing for simultaneous irradiation of multiple substrates with polarized ultraviolet rays while moving them in a controlled direction to efficiently form alignment layers.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional photo-alignment process is used to form an alignment layer, then the alignment layer can be formed with proper quality, but the process takes too long time
Solution Approach 1:
The patent divides the substrate processing into multiple independent substrates that can be processed simultaneously. Multiple substrates are loaded onto the stage and irradiated with polarized light at the same time, effectively segmenting the processing task to reduce overall process time while maintaining alignment layer quality
Solution Approach 2:
The patent combines multiple substrate irradiation processes into a single simultaneous operation. By using a polarized light source that can irradiate multiple substrates at once, the system merges what would otherwise be sequential operations into one parallel process, dramatically reducing total processing time
2Reliability
If multiple substrates are processed sequentially one by one, then each substrate receives proper irradiation, but the throughput is low
Solution Approach 1:
The patent implements continuous useful action by enabling simultaneous irradiation of multiple substrates. The polarized light source continuously irradiates all loaded substrates at the same time, eliminating idle time between sequential processing steps and maximizing productive utilization of the exposure system
Solution Approach 2:
The patent transitions from one-dimensional sequential processing to multi-dimensional parallel processing. By arranging multiple substrates in space and irradiating them simultaneously with polarized light, the system adds a spatial dimension to the processing, enabling multiple substrates to be handled in parallel rather than in sequence
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach significantly reduces the processing time by enabling the simultaneous irradiation of multiple substrates, thereby enhancing the throughput and efficiency of the photo-alignment process.
Implementation Method 1
the working portion having an ultra violet light source generating ultra violet ray to harden a photo alignment agent
Data Source
AI summary
An exposure method includes loading a first substrate on a loading portion , the first substrate having a photo alignment agent which is coated on the first substrate, irradiating the first substrate by moving the first substrate in a first speed in a first direction to a working portion while loading a second substrate on the loading portion, the working portion having an ultra violet light source generating ultra violet ray to harden a photo alignment agent, simultaneously irradiating the first substrate and the second substrate by moving the first substrate and the second substrate in the first direction in the working portion, and unloading the first substrate from an unloading portion while irradiating the second substrate by moving the second substrate in the first direction in the working portion.