Single Detector Alignment for Imprint Lithography
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Solution Overview
Problem
Conventional imprint lithography methods require multiple alignment detectors, increasing complexity and cost, whereas there is a need for a more efficient alignment process that reduces the number of detectors needed.
Innovation Solution
A method and apparatus that utilize a single intensity detector to align imprint templates and substrates by directing an alignment radiation beam towards grating-based alignment marks, allowing relative movement in multiple directions to determine alignment based on intensity changes, thereby eliminating the need for separate detectors for each direction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If separate diffraction gratings and associated detectors are provided for alignment in x and y directions, then alignment precision is improved, but device complexity increases
Solution Approach 1:
The patent combines the alignment detection functions for both x and y directions into a single detector. The detector receives alignment signals from diffraction gratings on both the substrate and imprint template, and processes these signals to determine alignment in multiple directions simultaneously, thereby reducing the number of detectors required while maintaining alignment precision
Solution Approach 2:
The single detector is designed to perform multiple alignment detection functions - it can detect alignment errors in both x and y directions by receiving and processing diffraction signals from gratings oriented in different directions, making it a multi-functional alignment detection device that replaces what would traditionally require separate detectors
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach simplifies the alignment process, reduces detector requirements, and enhances alignment accuracy using a single intensity detector for both x and y directions, improving the efficiency and cost-effectiveness of the imprint lithography process.
Implementation Method 1
directing an alignment radiation beam towards an imprint template alignment mark of the imprint template and an adjacent substrate alignment mark of the substrate, the imprint template alignment mark and the substrate alignment mark each comprising a grating which extends in a first direction and a grating which extends in a second direction... detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark
Data Source
AI summary
A method of aligning a substrate and an imprint template is disclosed. The method includes directing an alignment radiation beam towards an imprint template alignment mark and an adjacent substrate alignment mark, the imprint template alignment mark and the substrate alignment mark each including a grating which extends in a first direction and a grating which extends in a second direction, providing relative movement between the imprint template and the substrate in the first direction and in the second direction, using an intensity detector to detect the intensity of alignment radiation redirected in the zero-order direction by the imprint template alignment mark and the substrate alignment mark during the relative movement in the first direction and in the second direction, and determining an aligned position of the imprint template alignment mark and the substrate alignment mark based upon the detected intensity.