Single-Stage Exposure Device Alignment and Calibration
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional exposure devices in semiconductor manufacturing face challenges in accurately controlling and matching the positions of twin stages, leading to complex calibration processes and reduced accuracy, which affects production yields.
Innovation Solution
An exposure device with a single stage and one measurement unit, utilizing two or three optical interferometers, eliminates the need for complex twin-stage configurations, allowing for improved positioning and alignment detection on both substrates simultaneously.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If twin stages are used to simultaneously perform loading, aligning, and transferring steps, then production yield is improved, but position control accuracy and calibration complexity deteriorate
Solution Approach 1:
The patent merges two separate stages into a single stage structure, where one stage performs both substrate loading and alignment functions. This consolidation eliminates the need for complex twin-stage position matching while maintaining simultaneous processing capability, thereby resolving the contradiction between improved productivity and deteriorated position control accuracy
Solution Approach 2:
The single stage is designed with multi-functionality, serving as both a substrate holder and an alignment reference. The stage includes alignment marks that can be detected by alignment detection units, enabling the stage to perform multiple functions (loading, aligning, and positioning) that were previously distributed across two stages, thus improving position control accuracy while maintaining production yield
2Productivity
If twin stages are used to simultaneously perform exposure steps, then production yield is improved, but calibration process complexity increases
Solution Approach 1:
The patent combines two separate stage calibration systems into a single calibration process. By using one stage with integrated alignment marks instead of two independent stages, the calibration process is simplified from calibrating two separate measurement units and their coordinate systems to calibrating a single stage with known reference marks, thereby reducing calibration complexity while maintaining simultaneous exposure capability
Solution Approach 2:
The single stage incorporates alignment marks that serve as reference copies for position detection. These marks provide a standardized reference system that eliminates the need for complex inter-stage calibration, allowing the system to achieve accurate positioning without the cumbersome calibration procedures required by twin-stage configurations
3Measurement precision
If twin stages are used with multiple optical interferometers, then positioning capability is improved, but interferometer interference increases
Solution Approach 1:
The patent merges multiple optical interferometer systems into a single measurement system. Instead of using two independent sets of optical interferometers for two stages, the invention uses one optical interferometer to measure the position of a single stage, thereby eliminating interferometer-to-interferometer interference while maintaining high positioning capability through the use of alignment marks as reference points
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the accuracy and convenience of the exposure process, improving production yields by simplifying calibration and reducing interference among interferometers.
Implementation Method 1
one stage and one measurement unit with two or three optical interferometers
Implementation Method 2
a first alignment detection unit adapted for detecting alignment marks of the first substrate; a second alignment detection unit adapted for detecting alignment marks of the second substrate
Data Source
AI summary
An exposure method and an exposure device are provided. An exemplary exposure device includes a stage, a first clamp holder, a second clamp holder, an optical projection unit, a first alignment detection unit, and/or a second alignment detection unit. The stage includes a first region and a second region. The first clamp holder is located in the first region and adapted for holding a first substrate, and the second clamp holder is located in the second region and adapted for holding a second substrate. The optical projection unit is located above the stage and adapted for exposure of the first substrate or the second substrate. The first alignment detection unit is adapted for detecting alignment marks of the first substrate. The second alignment detection unit is adapted for detecting alignment marks of the second substrate. The exposure device can accurately position the stage and improve production yield.