Spherical SiO Powder Deposition for Fine, Low-Impurity Particles
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Solution Overview
Problem
Current methods for producing spherical SiO powder for lithium ion secondary batteries face challenges in achieving high circularity, small particle diameter, and low impurity contamination, with existing techniques either being costly or resulting in non-spherical particles due to mechanical pulverization and contamination issues.
Innovation Solution
A method involving the accumulation of SiO gas on a cooled deposition base, where a blade scrapes off the deposit without direct contact, leaving a portion on the base to accumulate and scrape again, resulting in a composite spherical shape with high circularity and low impurity contamination, utilizing a drum-shaped rotator for efficiency and specific parameters for growth rate, scraping period, and blade distance to control particle shape and size.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Volume of moving object
If mechanical pulverization is used to produce SiO powder, then particle size is reduced, but particle shape becomes non-spherical with corners and impurity contamination increases
Solution Approach 1:
The patent replaces mechanical pulverization systems with a chemical vapor deposition system. SiO gas is generated by heating silicon and silicon dioxide, then deposited on a cooled deposition base to form spherical particles directly, avoiding mechanical contact that causes corner formation and contamination
Solution Approach 2:
The patent utilizes phase transitions of silicon materials. Solid silicon and silicon dioxide are heated to generate SiO gas, which then condenses and deposits as solid spherical particles on the cooled base. This phase transition process naturally forms spherical shapes without mechanical intervention
2Volume of moving object
If mechanical pulverization is used to produce SiO powder, then particle size is reduced, but impurity contamination increases due to contact with pulverization container and medium
Solution Approach 1:
The patent replaces mechanical pulverization systems with a chemical vapor deposition system. SiO gas is generated by heating silicon and silicon dioxide, then deposited on a cooled deposition base to form spherical particles directly, avoiding mechanical contact that causes corner formation and contamination
Solution Approach 2:
The patent employs an inert atmosphere during the chemical vapor deposition process. The SiO gas is generated and deposited in a controlled environment that prevents oxidation and other contaminating reactions, ensuring high purity of the final product
3Volume of moving object
If jet mill or cyclone mill is used for fine pulverization, then particle size is reduced, but production cost increases
Solution Approach 1:
The patent utilizes phase transitions of silicon materials. Solid silicon and silicon dioxide are heated to generate SiO gas, which then condenses and deposits as solid spherical particles on the cooled base. This phase transition process naturally forms spherical shapes without mechanical intervention
Solution Approach 2:
The chemical vapor deposition process is self-forming, where the SiO gas automatically condenses and deposits into spherical particles on the cooled surface. No additional expensive pulverization equipment or processes are needed, as the spherical shape emerges naturally from the deposition mechanism
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method efficiently produces SiO powder with high circularity and small particle diameter, improving battery performance by reducing impurity contamination and enhancing cycle characteristics, while also reducing the energy required for pulverization and production costs.
Implementation Method 1
SiO gas generated by heating a mixture of silicon dioxide and silicon is accumulated on a cooled deposition base
Implementation Method 2
SiO gas generated by heating a mixture of silicon dioxide and silicon is accumulated on a cooled deposition base
Data Source
AI summary
To produce an SiO powder having a rounded spherical particulate shape and a small particle diameter; and further having a low degree of impurity contamination, efficiently and economically.A mixture of Si and SiO2 as an SiO gas generation raw material 9 is loaded into a crucible 2. The mixture in the crucible 2 is heated under a reduced pressure so as to generate SiO gas. The generated SiO gas is accumulated on a deposition base 5 rotating on the crucible 2. When SiO deposit 10 accumulated on the deposition base 5 is scraped off with a blade 7, a tip of the blade 7 is separated from a surface of the deposition base 5, and in a state in which a portion of the SiO deposit 10 accumulated on the deposition base 5 is left on the deposition base 5, the remaining SiO deposit 10 is scraped off by the blade 7 and collected as an SiO powder 11.