SiOF Coating for Lithography UV Resistance
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
The existing coatings used in lithographic apparatuses degrade over time when exposed to ultraviolet (UV) radiation, particularly in the presence of immersion liquids like water, leading to a decrease in lyophobic properties and functionality.
Innovation Solution
A coating comprising silicon (Si), oxygen (O), fluorine (F), and optionally carbon (C) and hydrogen (H), which forms an atomic-scale interpenetrating random network, providing improved UV resistance and maintaining lyophobic properties even after exposure to deep ultraviolet (DUV) radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If existing coatings are used in lithographic apparatuses exposed to UV radiation, then the apparatus can operate, but the coatings degrade over time and lose lyophobic properties
Solution Approach 1:
The patent applies a coating comprising multiple elements (Si, O, F, and optionally C and H) that forms an atomic-scale interpenetrating random network. This composite material structure provides both UV resistance and lyophobic properties, resolving the contradiction by combining materials with complementary characteristics to achieve both durability and functional persistence under UV exposure
Solution Approach 2:
The patent modifies the chemical composition parameters of the coating by incorporating fluorine and forming specific atomic networks. This changes the physical and chemical properties of the coating to include enhanced UV resistance and maintained lyophobicity, allowing the coating to withstand prolonged UV exposure while preserving its functional properties
2Productivity
If coatings are exposed to DUV radiation in immersion liquids, then imaging can be performed, but the coating properties decrease over time
Solution Approach 1:
The patent converts the harmful effect of UV radiation into a beneficial process by using the radiation to cure or crosslink the coating material. The DUV exposure that would normally degrade the coating instead activates the coating's protective properties, transforming the harmful radiation into a strengthening mechanism that enhances coating durability
Solution Approach 2:
The patent changes the chemical state of the coating through UV exposure, transforming it from an uncured to a cured state. This parameter change in the coating's molecular structure provides enhanced resistance to degradation while maintaining lyophobic properties, allowing the coating to withstand the imaging process conditions
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The coating effectively protects the surfaces of lithographic apparatus components from DUV radiation, maintaining its lyophobic properties and UV resistance, even after prolonged exposure, thereby ensuring consistent performance and longevity.
Implementation Method 1
A coating comprising silicon (Si), oxygen (O), fluorine (F), and optionally carbon (C) and hydrogen (H), which forms an atomic-scale interpenetrating random network
Data Source
AI summary
A coating is disclosed. The coating may be used in an apparatus having a radiation source, e.g. a lithographic apparatus. The coating comprises the elements Si, O, F and, optionally, C and H. An article is also disclosed. The article may be any one of the group consisting of a substrate table, an optical element, a shutter member, a sensor, a projection system, and a confinement structure. At least a portion of a surface of the article is coated with a coating. The coating comprises the elements Si, O, F and, optionally, C and H. The coating may comprise the elements Si, O, C and H.