Site Selective Optical Proximity Correction for Lithography
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Solution Overview
Problem
The optical proximity correction process in photolithographic manufacturing of microcircuits is computationally intensive and time-consuming due to the need for multiple iterations to achieve convergence, especially with modern complex designs, where edge fragments oscillate around the final target and require extensive processing of numerous edge fragments and simulation sites.
Innovation Solution
The process involves disabling selected edge fragments and simulation sites during optical proximity correction, allowing only enabled fragments to undergo simulation and displacement, with simulations sites being moved or removed based on specific conditions to reduce the number of iterations required for convergence.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If optical proximity correction is performed on all edge fragments through multiple iterations, then manufacturing precision is improved, but productivity deteriorates due to excessive computation time
Solution Approach 1:
The patent segments the set of edge fragments into two categories: stable edge fragments (those that have converged and do not require further processing) and unstable edge fragments (those that still need correction). By segmenting the work scope and focusing computational resources only on unstable fragments, the system maintains manufacturing precision while improving productivity.
Solution Approach 2:
Instead of performing full optical proximity correction on all edge fragments in each iteration, the patent applies partial action by processing only the subset of unstable edge fragments that require correction. This reduces the excessive computational action on already-converged fragments while maintaining the necessary precision for unstable ones.
2Manufacturing precision
If the number of simulation sites is increased to improve correction accuracy, then manufacturing precision is improved, but loss of time increases due to extended processing duration
Solution Approach 1:
The patent segments simulation sites based on the stability status of their corresponding edge fragments. Simulation sites associated with stable edge fragments are removed or marked for skipping, while sites associated with unstable fragments are retained. This segmentation reduces the total number of active simulation sites, decreasing processing time while maintaining correction accuracy where needed.
Solution Approach 2:
The patent discards simulation sites that are no longer necessary (those corresponding to stable edge fragments) during the iterative process. This discarding reduces computational overhead and processing time. The system recovers or maintains simulation sites only where needed (unstable fragments) to preserve manufacturing precision.
Data Source
AI summary
Techniques for performing optical proximity correction on a layout design or portion thereof are provided with various implementations of the invention. With various implementations of the invention, movement and simulation of selected edge fragments is disabled during the optical proximity correction process. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is then performed for the edge fragments that remain enabled. With further implementations of the invention, a simulation site is defined for ones of the edge fragments. The operations of the optical proximity correction process, such as for example simulation and displacement of edge segments, is performed for each simulation site. Additionally, during the optical proximity correction process, the simulations sites may be moved and or removed individually based on various conditions.