Slanted Showerhead Grooves for Uniform Plasma Distribution
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Solution Overview
Problem
The existing substrate processing apparatuses face challenges in achieving uniform plasma distribution due to the non-uniform plasma density between the substrate and the showerhead, leading to uneven layer thickness during processes like plasma enhanced chemical vapor deposition.
Innovation Solution
The showerhead features a slanted structure on its lower surface with strategically positioned grooves, including a central, edge, and intermediate grooves, which helps in reducing non-uniform plasma distribution by creating an asymmetrical pattern that controls plasma distribution uniformly across the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If the gap between the substrate and showerhead is narrowed to increase plasma density in the edge region, then the plasma density in the edge region is increased, but the plasma distribution becomes non-uniform causing uneven layer thickness
Solution Approach 1:
The showerhead lower surface includes a slanted structure that creates an asymmetrical pattern relative to the substrate, with the slant angle varying in different regions. This asymmetrical configuration compensates for the non-uniform plasma distribution by directing plasma flow more effectively to the edge regions while maintaining overall uniformity, thereby resolving the contradiction between increasing edge plasma density and maintaining uniform layer thickness.
2Manufacturing precision
If a conventional showerhead structure is used, then the device complexity is low, but the plasma distribution is non-uniform
Solution Approach 1:
The showerhead lower surface features a slanted structure with different slant angles in different regions, creating local variations in surface properties. This local quality approach allows the showerhead to optimize plasma distribution in specific areas (particularly edge regions) without requiring complete structural redesign, thus achieving improved plasma uniformity with moderate complexity increase.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration ensures a uniform plasma distribution, resulting in consistent layer thickness during processes like plasma enhanced chemical vapor deposition, enhancing the precision and quality of substrate processing.
Implementation Method 1
a showerhead body positioned at an upper surface of a reaction chamber and configured to inject a reaction gas toward a substrate in the reaction chamber
Implementation Method 2
As a gap between the substrate and the showerhead is narrowed, a density of the plasma in an edge region of the substrate may be relatively increased. Thus, the plasma may not be uniformly distributed between the substrate and the showerhead.
Data Source
AI summary
A showerhead includes a showerhead body positioned at an upper surface of a reaction chamber and configured to inject a reaction gas toward a substrate in the reaction chamber and at least one groove in a lower surface of the showerhead body, where the showerhead body is oriented toward the substrate and the lower surface of the showerhead body includes a slanted structure.