Lithography Slit Fingers Thermal Feedback Control
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Solution Overview
Problem
In advanced semiconductor manufacturing, the challenge is to maintain illumination uniformity during lithography processes, particularly due to heat absorption and deformation of lithographic apparatus components, leading to issues like radiation drift, movement, and reduced profile uniformity, which affect imaging quality and increase manufacturing costs.
Innovation Solution
A temperature-based feedback control mechanism is implemented to monitor and adjust the positions of slit fingers in the lithography apparatus, using in-situ temperature sensing data to control radiation uniformity by determining shifting values for the slit fingers, thereby maintaining consistent illumination profiles across the exposure area.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the lithography apparatus operates continuously to reduce idle time, then productivity improves, but heat absorption causes component deformation and radiation uniformity deteriorates
Solution Approach 1:
The patent implements a feedback control mechanism where temperature sensors continuously monitor the temperature of slit fingers, and the control system automatically adjusts their positions based on temperature measurements to maintain radiation uniformity during continuous operation
Solution Approach 2:
The patent changes the physical position parameter of slit fingers dynamically in response to temperature changes, allowing the system to adapt to thermal effects while maintaining operational continuity and radiation profile uniformity
2Manufacturing precision
If the slit fingers are adjusted frequently to maintain uniformity, then radiation profile uniformity improves, but system complexity and control difficulty increase
Solution Approach 1:
The patent applies local quality control by independently adjusting each slit finger's position based on its specific temperature measurement, allowing localized compensation without requiring complex global control of the entire illumination system
3Reliability
If the lithography apparatus uses advanced technology with smaller line widths, then device robustness improves, but sensitivity to radiation non-uniformity increases
Solution Approach 1:
The feedback control system continuously monitors and adjusts slit finger positions to compensate for thermal effects, ensuring the radiation profile remains uniform enough for advanced technology nodes with smaller line widths
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces idle time between exposures, enhances imaging quality, and improves the robustness of semiconductor devices by maintaining consistent radiation uniformity, even in advanced technology generations with smaller line widths.
Implementation Method 1
A plurality of temperature sensors are disposed adjacent to respective tip portions of the slit fingers
Data Source
AI summary
A method of operating an illuminator and apparatus thereof are proposed. A method includes: directing a radiation beam to the illuminator comprising slit fingers; sensing a temperature value of each of the slit fingers; determining a shifting value of the respective slit finger based on the temperature value; causing the respective slit finger to move according to the shifting value to form a light slit from the radiation beam; and exposing a workpiece using the light slit.