Slit Nozzle Projections for Uniform Substrate Cleaning
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Solution Overview
Problem
Existing methods for cleaning large glass substrates, such as those used in TFT-LCD manufacturing, face challenges with high costs and inefficient uniform cleaning due to the limited coverage of ultrasonic waves, which struggle to effectively remove fine particles from large substrate surfaces.
Innovation Solution
A nozzle design featuring a slit-shaped ejection hole with projections in the supply passage that divides the treatment liquid flow, causing it to swing left and right, ensuring uniform distribution and improved cleaning efficiency without the need for ultrasonic waves, by positioning the nozzle above the substrate conveying path with the slit-shaped ejection hole parallel to the substrate width.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-generated harmful factors
If ultrasonic waves are used to remove fine particles from the substrate surface, then particle removal capability is improved, but the cleaning uniformity across large substrates deteriorates and device complexity increases
Solution Approach 1:
The nozzle is divided into two separate parts (first part and second part) that are bonded together. The supply passage is formed by the combination of these two parts, allowing independent design and optimization of flow distribution. This segmentation enables the treatment liquid to be divided into left and right flows more effectively, improving cleaning uniformity across the substrate surface.
Solution Approach 2:
Projections are provided on the abutting surface of at least one of the two parts at specific locations to divide the treatment liquid flowing downward through the supply passage to the left and right. This local structural modification creates asymmetric flow distribution that compensates for pressure imbalances, ensuring uniform treatment liquid application across the entire substrate surface without requiring ultrasonic waves.
2Object-generated harmful factors
If ultrasonic wave generating device is introduced, then particle removal capability is improved, but manufacturing cost increases
Solution Approach 1:
The invention extracts and eliminates the ultrasonic wave generating device from the cleaning system. Instead of using complex ultrasonic technology, the patent achieves effective particle removal through a simplified nozzle structure with projections that create asymmetric treatment liquid flow. This extraction of the ultrasonic component significantly reduces manufacturing cost while maintaining or improving cleaning effectiveness.
Solution Approach 2:
The invention replaces expensive ultrasonic wave generating equipment with a simple, cost-effective nozzle structure made of basic materials. The nozzle consists of two parts that can be easily manufactured and bonded, providing a durable yet inexpensive solution for large substrate cleaning without requiring costly ultrasonic generators.
3Manufacturing precision
If treatment liquid flow is divided by projections, then cleaning uniformity is improved, but nozzle structure complexity increases
Solution Approach 1:
The nozzle is segmented into two separate parts that are bonded together, with the supply passage formed by their combination. This segmentation allows projections to be provided on the abutting surface of at least one part in a straightforward manner, creating effective left and right flow division without excessive structural complexity. The segmented design simplifies the implementation of flow-dividing projections compared to attempting to add them to a monolithic nozzle structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design enables uniform cleaning of large substrates with enhanced cleaning efficiency, reducing costs by eliminating the need for ultrasonic generators and ensuring all areas are cleaned uniformly, while improving the removal of fine particles and potentially using air or cleaning liquids to intersect the substrate flow direction for better cleaning.
Implementation Method 1
projections are provided on the abutting surface of at least one of the two parts so as to divide the treatment liquid flowing downward through the supply passage to the left and right
Implementation Method 2
The lower pressure on the side where the flow rate is lower attracts the larger flow causing the direction of flow to swing to the side with the lower pressure
Implementation Method 3
treatment liquid flowing downward through the supply passage
Implementation Method 4
fine particles adhering to the surface of the glass substrate are lifted up by ultrasonic waves applied from the lower surface of the glass substrate, and the lifted particles are washed away with ionized water
Data Source
AI summary
A nozzle for supplying a treatment liquid which makes it possible to perform uniform cleaning to a surface of a substrate even in a case where the size of a substrate is large. A slit-shaped ejection hole is formed at the lower end of the nozzle for supplying a treatment liquid. In the nozzle, a passage for supplying a treatment liquid which leads to the slit-shaped ejection hole is formed by bonding two nozzle parts to each other. Projections are provided on the abutting surface of at least one of the two nozzle parts so as to divide a treatment liquid flowing downward through the supply passage into left and right.


